Vincent R Urdi

US Patent:

20050266335, Dec 1, 2005

Filed:

Sep 20, 2004

Appl. No.:

10/945334

Inventors:

Donald Johnson - Wayland MA, US
William Weber - Rumford RI, US
Pamela Waterson - Northbridge MA, US
Vincent Urdi - Raynham MA, US
Joseph Molea - Woburn MA, US
Thomas Strand - Corvallis OR, US

International Classification:

G03F007/00
G03F007/004

US Classification:

430270100, 430330000, 430322000

Abstract:

A photoimagable composition suitable for use as a negative photoresist comprising: (A) at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin; (B) at least one polycaprolactone polyol reactive diluent, wherein the amount of component (A) is from about 95% to about 75% by weight of the sum of (A) and (B) and the amount of component (B) is from about 5% to about 25% by weight of the sum of (A) and (B); (C) at least one photoacid generator in an amount from about 2.5 to about 12.5 parts per hundred parts of resin and reactive diluent, which initiates polymerization upon exposure to actinic radiation; and (D) a sufficient amount of solvent to dissolve (A), (B) and (C); wherein the solvent comprises 2-pentanone, 3-pentanone, and 1,3-dioxolane and mixtures thereof.