Medical School Beijing Medical University Graduated: 1983 Medical School Seton Hall University School Graduate Medical Education Graduated: 1999 Medical School Seton Hall University School Graduate Medical Education Graduated: 2002 Medical School Seton Hall University School Graduate Medical Education Graduated: 2003
Dr. Ma graduated from the Beijing Med Univ, Beijing City, Beijing, China in 1983. She works in Edison, NJ and specializes in Neurology and Epileptologist. Dr. Ma is affiliated with John F Kennedy Medical Center.
American Board of Psychiatry and Neurology Certification in Neurology (Psychiatry and Neurology) American Board of Psychiatry and Neurology Sub-certificate in Clinical Neurophysiology (Psychiatry and Neurology) American Board of Psychiatry and Neurology Sub-certificate in Neuromuscular Medicine (Psychiatry and Neurology)
Name / Title
Company / Classification
Phones & Addresses
Wei Ma Principal
The Mountwealth Group LLC Business Services
1480 Us Hwy 46, Parsippany, NJ 07054
Wei Wei Ma
Wei Ma MD Neurologist · Pediatric Neurologist
65 James St, Edison, NJ 08820 (732)3217010
Wei W. Ma Neurology
J F K Johnson Rehabilition Institute Rehabilitation Center
65 James St, Edison, NJ 08820 PO Box 3059, Edison, NJ 08818 (732)3217070
National Institutes of Health
Applications Br Chief
Office of Computer and Communications Sy
Applications Branch Chief
Nlm
Software Support Section Head, Department of Healt
A method includes forming a first region including a pair of first FinFETs and a second region including a pair of second FinFETs on a substrate. Each FinFET includes a metal gate having a first spacer adjacent thereto, and each first FinFET has a gate dielectric that is thicker than a gate dielectric of each second FinFET, such that the first FinFETs can be higher voltage input/output devices. The method forms a first contact between the metal gates of the pair of first FinFETs with a second spacer thereabout, the second spacer contacting a portion of each first spacer. The second spacer thus has a portion extending parallel to the metal gates, and a portion extending perpendicular to the metal gates. A second contact is formed between the metal gates of the pair of second FinFETs, and the second contact devoid of the second spacer.