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Wigbert J Siekhaus

age ~86

from Berkeley, CA

Also known as:
  • Wigbert S
  • T S
Phone and address:
1110 Cragmont Ave, Berkeley, CA 94708
(510)5285071

Wigbert Siekhaus Phones & Addresses

  • 1110 Cragmont Ave, Berkeley, CA 94708 • (510)5285071 • (510)5480704 • (510)6669642
  • 1119 Cragmont Ave, Berkeley, CA 94708 • (510)5480704
  • Captain Cook, HI
  • 419 Village Dr, El Cerrito, CA 94530 • (510)5285071
  • Oakland, CA

Work

  • Company:
    Lawrence livermore national laboratory
  • Position:
    Scientist

Languages

English

Industries

Research

Resumes

Wigbert Siekhaus Photo 1

Scientist

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Location:
1119 Cragmont Ave, Berkeley, CA 94708
Industry:
Research
Work:
Lawrence Livermore National Laboratory
Scientist
Languages:
English

Us Patents

  • Apparatus For Depositing A Low Work Function Material

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  • US Patent:
    7118630, Oct 10, 2006
  • Filed:
    Aug 10, 2000
  • Appl. No.:
    09/636134
  • Inventors:
    Mehdi Balooch - Berkeley CA, US
    Long N. Dinh - Concord CA, US
    Wigbert J. Siekhaus - Berkeley CA, US
  • Assignee:
    The Regents of the University of California - Oakland CA
  • International Classification:
    C23C 16/00
  • US Classification:
    118726, 427596, 427597
  • Abstract:
    Short-wavelength photons are used to ablate material from a low work function target onto a suitable substrate. The short-wavelength photons are at or below visible wavelength. The elemental composition of the deposit is controlled by the composition of the target and the gaseous environment in which the ablation process is performed. The process is carried out in a deposition chamber to which a short-wavelength laser is mounted and which includes a substrate holder which can be rotated, tilted, heated, or cooled. The target material is mounted onto a holder that spins the target during laser ablation. In addition, the deposition chamber is provided with a vacuum pump, an external gas supply with atomizer and radical generator, a gas generator for producing a flow of molecules on the substrate, and a substrate cleaning device, such as an ion gun. The substrate can be rotated and tilted, for example, whereby only the tip of an emitter can be coated with a low work function material.
  • Method For Identifying Biochemical And Chemical Reactions And Micromechanical Processes Using Nanomechanical And Electronic Signal Identification

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  • US Patent:
    56208545, Apr 15, 1997
  • Filed:
    Mar 13, 1995
  • Appl. No.:
    8/402800
  • Inventors:
    John F. Holzrichter - Berkeley CA
    Wigbert J. Siekhaus - Berkeley CA
  • Assignee:
    Regents of the University Of California - Oakland CA
  • International Classification:
    C12Q 168
    G01N 3353
    G01N 2100
    C12P 1934
  • US Classification:
    435 6
  • Abstract:
    A scanning probe microscope, such as an atomic force microscope (AFM) or a scanning tunneling microscope (STM), is operated in a stationary mode on a site where an activity of interest occurs to measure and identify characteristic time-varying micromotions caused by biological, chemical, mechanical, electrical, optical, or physical processes. The tip and cantilever assembly of an AFM is used as a micromechanical detector of characteristic micromotions transmitted either directly by a site of interest or indirectly through the surrounding medium. Alternatively, the exponential dependence of the tunneling current on the size of the gap in the STM is used to detect micromechanical movement. The stationary mode of operation can be used to observe dynamic biological processes in real time and in a natural environment, such as polymerase processing of DNA for determining the sequence of a DNA molecule.
  • Predicting Threshold And Location Of Laser Damage On Optical Surfaces

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  • US Patent:
    46671013, May 19, 1987
  • Filed:
    Feb 4, 1985
  • Appl. No.:
    6/697828
  • Inventors:
    Wigbert Siekhaus - Berkeley CA
  • Assignee:
    The United States of America as respresented by the United States
    Department of Energy - Washington DC
  • International Classification:
    G01N 23227
  • US Classification:
    250307
  • Abstract:
    An apparatus useful in the prediction of the damage threshold of various optical devices, the location of weak spots on such devices and the location, identification, and elimination of optical surface impurities comprising, a focused and pulsed laser, an photo electric detector/imaging means, and a timer. The weak spots emit photoelectrons when subjected to laser intensities that are less than the intensity actually required to produce the damage. The weak spots may be eliminated by sustained exposure to the laser beam.
  • Laser Ablated Hard Coating For Microtools

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  • US Patent:
    57471207, May 5, 1998
  • Filed:
    Feb 11, 1997
  • Appl. No.:
    8/799085
  • Inventors:
    William McLean - Oakland CA
    Mehdi Balooch - Berkeley CA
    Wigbert J. Siekhaus - Berkeley CA
  • Assignee:
    Regents Of The University Of California - Oakland CA
  • International Classification:
    B05D 306
  • US Classification:
    427596
  • Abstract:
    Wear-resistant coatings composed of laser ablated hard carbon films, are deposited by pulsed laser ablation using visible light, on instruments such as microscope tips and micro-surgical tools. Hard carbon, known as diamond-like carbon (DLC), films produced by pulsed laser ablation using visible light enhances the abrasion resistance, wear characteristics, and lifetimes of small tools or instruments, such as small, sharp silicon tips used in atomic probe microscopy without significantly affecting the sharpness or size of these devices. For example, a 10-20 nm layer of diamond-like carbon on a standard silicon atomic force microscope (AFM) tip, enables the useful operating life of the tip to be increased by at least twofold. Moreover, the low inherent friction coefficient of the DLC coating leads to higher resolution for AFM tips operating in the contact mode.
  • Low Work Function Surface Layers Produced By Laser Ablation Using Short-Wavelength Photons

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  • US Patent:
    61208574, Sep 19, 2000
  • Filed:
    May 18, 1998
  • Appl. No.:
    9/080109
  • Inventors:
    Mehdi Balooch - Berkeley CA
    Long N. Dinh - Concord CA
    Wigbert J. Siekhaus - Berkeley CA
  • Assignee:
    The Regents of the University of California - Oakland CA
  • International Classification:
    C23C 1428
    B05D 512
  • US Classification:
    427596
  • Abstract:
    Short-wavelength photons are used to ablate material from a low work function target onto a suitable substrate. The short-wavelength photons are at or below visible wavelength. The elemental composition of the deposit is controlled by the composition of the target and the gaseous environment in which the ablation process is performed. The process is carried out in a deposition chamber to which a short-wavelength laser is mounted and which includes a substrate holder which can be rotated, tilted, heated, or cooled. The target material is mounted onto a holder that spins the target during laser ablation. In addition, the deposition chamber is provided with a vacuum pump, an external gas supply with atomizer and radical generator, a gas generator for producing a flow of molecules on the substrate, and a substrate cleaning device, such as an ion gun. The substrate can be rotated and tilted, for example, whereby only the tip of an emitter can be coated with a low work function material.
  • Imaging, Cutting, And Collecting Instrument And Method

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  • US Patent:
    54619076, Oct 31, 1995
  • Filed:
    Mar 23, 1993
  • Appl. No.:
    8/035741
  • Inventors:
    Robert J. Tench - Tracy CA
    Wigbert J. Siekhaus - Berkeley CA
    Mehdi Balooch - Berkeley CA
    Rodney L. Balhorn - Livermore CA
    Michael J. Allen - Davis CA
  • Assignee:
    Regents of the University of California - Oakland CA
  • International Classification:
    H01J 314
  • US Classification:
    73105
  • Abstract:
    Instrumentation and techniques to image small objects, such as but not limited to individual human chromosomes, with nanometer resolution, to cut-off identified parts of such objects, to move around and manipulate such cut-off parts on the substrate on which they are being imaged to predetermined locations on the substrate, and to remove the cut-off parts from the substrate. This is accomplished using an atomic force microscope (AFM) and by modification of the conventional cantilever stylus assembly of an AFM, such that plural cantilevers are used with either sharp-tips or knife-edges thereon. In addition, the invention can be utilized for measuring hardness of materials.

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