Xiao S Chen

US Patent:

6436928, Aug 20, 2002

Filed:

Dec 14, 2000

Appl. No.:

09/737036

Inventors:

Neng-Yang Shih - North Caldwell NJ
Gregory A. Reichard - Morris Plains NJ
Sunil Paliwal - Scotch Plains NJ
David J. Blythin - North Caldwell NJ
John J. Piwinski - Clinton Township NJ
Dong Xiao - Scotch Plains NJ
Xiao Chen - Edison NJ

Assignee:

Schering Corporation - Kenilworth NJ

International Classification:

A61K 314166

US Classification:

5142278, 514396, 514399, 514400, 5483165, 5483235

Abstract:

A compound represented by the structural formula or a pharmaceutically acceptable salt thereof, wherein Ar and Ar are optionally substituted heteroaryl or optionally substituted phenyl; X is âOâ, âSO â, âNR â, âNCOR â or âNR SO R ; âis X is âOâ, âSâ or optionally substituted nitrogen; Y is O, S or NR ; Y is H, alkyl, âNR R , âSCH , R -aryl(CH ) â, R -heteroaryl-(CH ) â, â(CH ) -heterocycloalkyl, -alkyl-NHâC(O)O-alkyl or âNHC(O)R ; R , R , R and R are H, alkyl, OH-alkyl, cycloalkyl, âCHF , âCH F or âCF ; or R and R form an alkylene ring; or R and R together are O; R is H, alkyl, âOR or âSR ; and the remaining variables are as defined in the specification, is disclosed, as well as a pharmaceutical compositions comprising said compound, methods of using said compound as a neurokinin antagonist, and the combination of said compounds with a selective serotonin reuptake inhibitor.

US Patent:

6635630, Oct 21, 2003

Filed:

Jun 6, 2002

Appl. No.:

10/163663

Inventors:

Neng-Yang Shih - North Caldwell NJ
Gregory A. Reichard - Morris Plains NJ
Sunil Paliwal - Scotch Plains NJ
David J. Blythin - North Caldwell NJ
John J. Piwinski - Clinton Township NJ
Dong Xiao - Scotch Plains NJ
Xiao Chen - Edison NJ

Assignee:

Schering Corporation - Kenilworth NJ

International Classification:

A61K 31330

US Classification:

514183, 514396, 514397, 514398, 514400, 5483235, 5483215, 5483251, 5483255, 5483265, 548134

Abstract:

Compound represented by the structural formula or a pharmaceutically acceptable salt thereof, wherein Ar and Ar are optionally substituted heteroaryl or optionally substituted phenyl; X is âOâ, âSâ, âSOâ, âSO â, âNR â, âNCOR â or âNR SO R ; âis selected from the group consisting of X is âOâ, âSâ or âNR â; Y is O, S or NR ; Y is H, C -C alkyl, âNR R , âSCH , R -aryl(CH ) â, R -heteroaryl-(CH ) â, â(CH ) âheterocycloalkyl, â(C -C )alkyl-NHâC(O)O(C -C )alkyl or âNHC(O)R ; R is H or â(CH ) âG, wherein n is 0-5, G is H, âCF , âCHF , âCH F, âOH, âOâ(C -C alkyl), âSO R , âOâ(C -C cycloalkyl), âNR R , âSO NR R , âNR SO R , âNR COR , âNR (CONR R ), âCONR R , âCOOR , C -C cycloalkyl, R -aryl, R -heteroaryl, and provided when n =0, G is not H; R , R , R and R are H, alkyl, cycloalkyl, âCHF , âCH F or âCF ; or R and R , together with the carbon to which they are attached, form an alkylene ring; or R and R together are O; R is R or âOH; and the remaining variables are as defined in the specification, methods of treating diseases susceptible to treatment with neurokinin antagonists with said compounds, and pharmaceutical compositions comprising said compounds are disclosed. Also disclosed are pharmaceutical compositions comprising an effective amount of a compound of claim 1, at least one pharmaceutically acceptable carrier, and in combination with an effective amount of a selective serotonin reuptake inhibitor.

US Patent:

7354922, Apr 8, 2008

Filed:

Dec 1, 2005

Appl. No.:

11/291363

Inventors:

Dong Xiao - Warren NJ, US
Anandan Palani - Bridgewater NJ, US
Cheng Wang - Summit NJ, US
Xianhai Huang - Warren NJ, US
Sapna S. Shah - Jamesburg NJ, US
Ashwin U. Rao - Avenel NJ, US
Xiao Chen - Edison NJ, US
Sunil Paliwal - Monroe Township NJ, US
Neng-Yang Shih - Warren NJ, US

Assignee:

Schering Corporation - Kenilworth NJ

International Classification:

A01N 43/58
A01N 43/60
C07D 245/00
C07D 241/36
C07D 471/00

US Classification:

514249, 540460, 544349

Abstract:

A compound having the general structure shown in Formula (I):.

US Patent:

7511062, Mar 31, 2009

Filed:

May 16, 2005

Appl. No.:

11/130359

Inventors:

Rongze Kuang - Green Brook NJ, US
David Blythin - North Caldwell NJ, US
Neng-Yang Shih - Warren NJ, US
Xiao Chen - Edison NJ, US
Jianhua Cao - Edison NJ, US
Danlin Gu - Kirkland WA, US
Ying Huang - Berkeley Heights NJ, US
John H. Schwerdt - Lake Hiawatha NJ, US
Pauline C. Ting - New Providence NJ, US
Li Xiao - Cranbury NJ, US

Assignee:

Schering Corporation - Kenilworth NJ

International Classification:

C07D 215/38
A61K 31/44

US Classification:

514312, 514314, 546153, 546159

Abstract:

The invention claims compounds of the formula.

US Patent:

7682940, Mar 23, 2010

Filed:

Sep 14, 2005

Appl. No.:

11/227974

Inventors:

Zhiyuan Ye - Cupertino CA, US
Yihwan Kim - Milpitas CA, US
Xiaowei Li - Sunnyvale CA, US
Ali Zojaji - Santa Clara CA, US
Nicholas C. Dalida - Fremont CA, US
Jinsong Tang - Santa Clara CA, US
Xiao Chen - San Jose CA, US
Arkadii V. Samoilov - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/20
H01L 21/36

US Classification:

438478, 438482, 438488, 438719, 438753, 257E2109, 257E21115, 257E21461, 257E21214, 257E21215

Abstract:

In a first aspect, a first method of forming an epitaxial film on a substrate is provided. The first method includes (a) providing a substrate; (b) exposing the substrate to at least a silicon source so as to form an epitaxial film on at least a portion of the substrate; and (c) exposing the substrate to HCl and Cl2 so as to etch the epitaxial film and any other films formed during step (b). Numerous other aspects are provided.

US Patent:

7723342, May 25, 2010

Filed:

May 11, 2006

Appl. No.:

11/432133

Inventors:

Anandan Palani - Bridgewater NJ, US
Jing Su - Scotch Plains NJ, US
Dong Xiao - Warren NJ, US
Xianhai Huang - Warren NJ, US
Ashwin U. Rao - Avenel NJ, US
Xiao Chen - Edison NJ, US
Haiqun Tang - Belle Mead NJ, US
Jun Qin - Edison NJ, US
Ying Huang - Berkeley Heights NJ, US
Robert G. Aslanian - Rockaway NJ, US
Brian A. McKittrick - New Vernon NJ, US

Assignee:

Schering Corporation - Kenilworth NJ

International Classification:

C07D 491/052
A61K 31/519
A61P 35/00
A61P 29/00
A61P 3/10
A61P 9/00
A61P 11/00

US Classification:

5142601, 544278

Abstract:

A compound having the general structure of Formula (I):.

US Patent:

7732305, Jun 8, 2010

Filed:

Jul 28, 2006

Appl. No.:

11/494903

Inventors:

Zhiyuan Ye - Cupertino CA, US
Yihwan Kim - Milpitas CA, US
Xiaowei Li - Sunnyvale CA, US
Ali Zojaji - Santa Clara CA, US
Nicholas C. Dalida - Fremont CA, US
Jinsong Tang - Santa Clara CA, US
Xiao Chen - San Jose CA, US
Arkadii V. Samoilov - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/20

US Classification:

438478, 438488, 438719, 438753, 257E23116, 257E23128, 257E21502

Abstract:

In a first aspect, a method of forming an epitaxial film on a substrate is provided. The method includes (a) providing a substrate; (b) exposing the substrate to a silicon source and a carbon source so as to form a carbon-containing silicon epitaxial film; (c) encapsulating the carbon-containing silicon epitaxial film with an encapsulating film; and (d) exposing the substrate to Cl2 so as to etch the encapsulating film. Numerous other aspects are provided.

US Patent:

7737155, Jun 15, 2010

Filed:

Jun 29, 2007

Appl. No.:

11/771538

Inventors:

Anandan Palani - Bridgewater NJ, US
Dong Xiao - Warren NJ, US
Xianhai Huang - Warren NJ, US
Ashwin U. Rao - Avenel NJ, US
Xiao Chen - Edison NJ, US
Jun Qin - Edison NJ, US
Ying R. Huang - Berkeley Heights NJ, US
Robert G. Aslanian - Rockaway NJ, US

Assignee:

Schering Corporation - Kenilworth NJ

International Classification:

C07D 491/052
A61K 31/519
A61P 9/00
A61P 25/00
A61P 33/00
A61P 29/00
A61P 1/00
A61P 3/10

US Classification:

5142601, 544278

Abstract:

The present invention provides compounds of Formula (I):.