Xiao L Chen

US Patent:

6627841, Sep 30, 2003

Filed:

May 9, 2001

Appl. No.:

09/851853

Inventors:

Xiao Chen - Peoria IL
Yi Dong - Peoria IL
Edward T. Martin - Decatur IL
Zhishang Yang - Dunlap IL
Wayne Tanner - Chicago IL

Assignee:

Caterpillar Inc. - Peoria IL

International Classification:

B23K 910

US Classification:

219110, 219109, 219119, 703 1, 703 2, 703 6

Abstract:

A method for designing a weld fixture. The method includes modeling a set of distortions produced by applied mechanical forces on a material to be welded, modeling a set of distortions produced by applied thermal forces on the material to be welded, determining a set of reaction forces at a series of locations on a simulated weld fixture as a function of the modeled distortions, and designing a weld fixture as a function of the set of reaction forces.

US Patent:

6789051, Sep 7, 2004

Filed:

Sep 21, 2000

Appl. No.:

09/667077

Inventors:

Xiao Chen - Peoria IL
Yi Dong - Peoria IL
Ashok Nanjundan - Savoy IL

Assignee:

Caterpillar Inc - Peoria IL

International Classification:

G06F 1710

US Classification:

703 2, 703 7, 706915, 2191171

Abstract:

A method and apparatus for providing a simulation of a welding process using integrated models which are interconnected by an interconnection tool to determine stresses and distortions of a material being welded. The method and apparatus includes determining a model of a geometry of a set of materials to be welded, defining a set of coordinates of elements and nodes of the geometry model for a finite element analysis mesh, delivering the finite element analysis mesh coordinates to a thermal analysis model, the thermal analysis model including an analytical solution model and a finite element analysis model, and determining a thermal analysis of the welding process, the thermal analysis responsively providing a thermal history of the welding process. The method and apparatus further includes delivering the thermal history of the welding process to a structural analysis model, and providing a structural analysis of the welding process as a function of the thermal history.

US Patent:

7082338, Jul 25, 2006

Filed:

Jul 14, 2000

Appl. No.:

09/616457

Inventors:

Xiao Chen - Peoria IL, US
Yi Dong - Peoria IL, US
Tarsem S. Jutla - Peoria IL, US
Ashok Nanjundan - Savoy IL, US

Assignee:

Caterpillar Inc. - Peoria IL

International Classification:

G05B 13/02

US Classification:

700 31, 703 1, 703 6

Abstract:

A method for providing a process model for a material in a manufacturing process. The method includes the steps of receiving stress and distortion information of the material from a previous manufacturing process, determining updated stress and distortion information of the material from a process model for the present manufacturing process, the updated stress and distortion information being a function of the stresses and distortions caused by the present manufacturing process and the stresses and distortions from the previous manufacturing process, and providing the updated stress and distortion information of the material to a subsequent manufacturing process.

US Patent:

7682940, Mar 23, 2010

Filed:

Sep 14, 2005

Appl. No.:

11/227974

Inventors:

Zhiyuan Ye - Cupertino CA, US
Yihwan Kim - Milpitas CA, US
Xiaowei Li - Sunnyvale CA, US
Ali Zojaji - Santa Clara CA, US
Nicholas C. Dalida - Fremont CA, US
Jinsong Tang - Santa Clara CA, US
Xiao Chen - San Jose CA, US
Arkadii V. Samoilov - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/20
H01L 21/36

US Classification:

438478, 438482, 438488, 438719, 438753, 257E2109, 257E21115, 257E21461, 257E21214, 257E21215

Abstract:

In a first aspect, a first method of forming an epitaxial film on a substrate is provided. The first method includes (a) providing a substrate; (b) exposing the substrate to at least a silicon source so as to form an epitaxial film on at least a portion of the substrate; and (c) exposing the substrate to HCl and Cl2 so as to etch the epitaxial film and any other films formed during step (b). Numerous other aspects are provided.

US Patent:

7732305, Jun 8, 2010

Filed:

Jul 28, 2006

Appl. No.:

11/494903

Inventors:

Zhiyuan Ye - Cupertino CA, US
Yihwan Kim - Milpitas CA, US
Xiaowei Li - Sunnyvale CA, US
Ali Zojaji - Santa Clara CA, US
Nicholas C. Dalida - Fremont CA, US
Jinsong Tang - Santa Clara CA, US
Xiao Chen - San Jose CA, US
Arkadii V. Samoilov - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/20

US Classification:

438478, 438488, 438719, 438753, 257E23116, 257E23128, 257E21502

Abstract:

In a first aspect, a method of forming an epitaxial film on a substrate is provided. The method includes (a) providing a substrate; (b) exposing the substrate to a silicon source and a carbon source so as to form a carbon-containing silicon epitaxial film; (c) encapsulating the carbon-containing silicon epitaxial film with an encapsulating film; and (d) exposing the substrate to Cl2 so as to etch the encapsulating film. Numerous other aspects are provided.

US Patent:

7778898, Aug 17, 2010

Filed:

Jan 15, 2004

Appl. No.:

10/757578

Inventors:

Eugene Rider - Oak Brook IL, US
Scott Milkovich - Glen Ellyn IL, US
Tina Brown - Wheaton IL, US
Xiao Chen - Naperville IL, US

Assignee:

RAM Consulting - Oak Brook IL

International Classification:

G06Q 40/00

US Classification:

705 35

Abstract:

A method and system is provided to uniformly evaluate product characteristics and identifying risk factors associated with the products so that a comprehensive scoring system provides an attractiveness score by age brackets and also provides for a consistent quantification process so that an overall characterization may be viewed by a color coded scoring scheme. The scoring system is based on predetermined scores created for age brackets and pre-identified product attributes. Through user feedback a new product may be evaluated using a series of questions that are associated with the predetermined scores producing an overall attractiveness score. Through another set of questions and predetermined mitigation scores, a mitigations score may be developed for the product so that by combining the attractiveness score with the mitigation score and comprehensive product score may be produced indicative of risk. The invention also provides for exploring various categories of characteristics that may lead to particular behavioral responses to the product by age group.

US Patent:

7960256, Jun 14, 2011

Filed:

May 12, 2010

Appl. No.:

12/779022

Inventors:

Zhiyuan Ye - Cupertino CA, US
Yihwan Kim - Milpitas CA, US
Xiaowei Li - Sunnyvale CA, US
Ali Zojaji - Santa Clara CA, US
Nicholas C. Dalida - Fremont CA, US
Jinsong Tang - Santa Clara CA, US
Xiao Chen - San Jose CA, US
Arkadii V. Samoilov - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/20
H01L 21/36

US Classification:

438478, 438482, 438488, 438719, 438753, 257E31045, 257E29155, 257E23122, 257E21054, 257E21055, 257E21182

Abstract:

In a first aspect, a method of forming an epitaxial film on a substrate is provided. The method includes (a) providing a substrate; (b) exposing the substrate to a silicon source and a carbon source so as to form a carbon-containing silicon epitaxial film; (c) encapsulating the carbon-containing silicon epitaxial film with an encapsulating film; and (d) exposing the substrate to Cl2 so as to etch the encapsulating film. Numerous other aspects are provided.

US Patent:

8276091, Sep 25, 2012

Filed:

Sep 15, 2004

Appl. No.:

10/941088

Inventors:

Robert Altkorn - Chicago IL, US
Xiao Chen - Naperville IL, US
Scott Milkovich - Glen Ellyn IL, US
John Owens - Oak Lawn IL, US
Brian Rider - Sommerville MA, US
Eugene Rider - Oak Brook IL, US
Daniel Stool - Addison IL, US

Assignee:

Ram Consulting - Oak Brook IL

International Classification:

G06F 3/048

US Classification:

715771, 715701, 715763, 715799, 715810, 715848, 715861, 345621, 345622, 345630, 345653, 345664, 345679

Abstract:

An apparatus and method for assessing a hazard associated with an object are disclosed. The apparatus includes a haptic input/output device coupled to a computer with haptic modeling software and a display device. A virtual object and a virtual passageway are displayed on the display device. The virtual passageway includes a haptic layer along a surface thereof. Force applied by a user to the haptic input/output device causes a cursor on the display device to move the virtual object into the virtual passageway. An interaction of the virtual object with the haptic layer generates a virtual contact force which may be determined by the user sensing a corresponding tactile feedback force generated by the haptic input/output device and/or by the computer processor. The magnitude of the virtual contact force may be used to assess a hazard associated with the virtual object.