Xing Sui Chen

US Patent:

6907167, Jun 14, 2005

Filed:

Jan 19, 2001

Appl. No.:

09/765544

Inventors:

Hwan J. Jeong - Los Altos CA, US
Xing Chen - San Jose CA, US

Assignee:

Gazillion Bits, Inc. - San Jose CA

International Classification:

G20B006/42

US Classification:

385 39, 385 24, 359497, 398 82

Abstract:

An optical interleaver is described, comprising a splitting element for splitting an incident beam into a first optical signal directed along a first path and a second optical signal directed along a second path, a first resonant element positioned along the first path, a second resonant element positioned along the second path, and a combining element positioned to receive and to interferometrically combine the outputs of the first and second resonant to produce the output signal. The optical interleaver may be implemented using a free-space configuration using a beamsplitter and a plurality of resonant cavities such as asymmetric Fabry-Perot resonators or Michelson-Gires-Tournois resonators. In an alternative preferred embodiment, the optical interleaver may be implemented in a Mach-Zender-style configuration using couplers and fiber ring resonators.

US Patent:

8003935, Aug 23, 2011

Filed:

Oct 10, 2007

Appl. No.:

11/869978

Inventors:

Timothy Roger Robinson - Burland, GB
Mark Attwood - Cupertino CA, US
Xing Chen - Lexington MA, US
William M. Holber - Winchester MA, US
Mark Philip Longson - Waterhouses, GB
Jonathan Henry Palk - Sandbach, GB
Ali Shajii - Canton MA, US
John A. Smith - North Andover MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H01J 49/26

US Classification:

250288, 250281, 250282, 250283, 250423 R, 250424

Abstract:

A system and methods are described for generating reagent ions and product ions for use in a quadruple mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadruple mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system.

US Patent:

8003936, Aug 23, 2011

Filed:

Oct 10, 2007

Appl. No.:

11/869980

Inventors:

Timothy Roger Robinson - Burland, GB
Mark Attwood - Cupertino CA, US
Xing Chen - Lexington MA, US
William M. Holber - Winchester MA, US
Mark Philip Longson - Waterhouses, GB
Jonathan Henry Palk - Sandbach, GB
Ali Shajii - Canton MA, US
John A. Smith - North Andover MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H01J 49/26

US Classification:

250288, 250281, 250282, 250283, 250423 R, 250424

Abstract:

A system, components thereof, and methods are described for time-of-flight mass spectrometry. A microwave or high-frequency RF energy source is used to ionize a reagent vapor to form reagent ions. The reagent ions enter a chamber and interact with a fluid sample to form product ions. The reagent ions and product ions are directed to a time-of-flight mass spectrometer module for detection and determination of a mass value for the ions. The time-of-flight mass spectrometer module can include an optical system and an ion beam adjuster for focusing, interrupting, or altering a flow of reagent and product ions according to a specified pattern. The time-of-flight mass spectrometer module can include signal processing techniques to collect and analyze an acquired signal, for example, using statistical signal processing, such as maximum likelihood signal processing.

US Patent:

8334505, Dec 18, 2012

Filed:

Feb 6, 2008

Appl. No.:

12/026799

Inventors:

Timothy Roger Robinson - Burland, GB
Mark Attwood - Cupertino CA, US
Xing Chen - Lexington MA, US
William M. Holber - Winchester MA, US
Mark Philip Longson - Waterhouses, GB
Jonathan Henry Palk - Sandbach, GB
Ali Shajii - Canton MA, US
John A. Smith - North Andover MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H01J 49/26

US Classification:

250288, 250281, 250282, 250283, 250423 R, 250424

Abstract:

A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system.

US Patent:

57710945, Jun 23, 1998

Filed:

Jan 29, 1997

Appl. No.:

8/790090

Inventors:

Joseph Carter - San Jose CA
Jennming Chen - Campbell CA
Xing Chen - San Jose CA

Assignee:

Kla-Tencor Corporation - San Jose CA

International Classification:

G01J 336
G01N 2121

US Classification:

356326

Abstract:

The pixel position-to-wavelength calibration function of film measurement devices such as spectroscopic ellipsometers and spectroreflectometers may shift due to temperature and humidity changes and mechanical factors. One or more wavelength markers provided by the light source or reference sample may be used to correct the calibration function. The pixel positions of one or more persistent wavelength markers are noted during the calibration process and the current positions of such markers are again noted to account for shifts due to various factors to correct the calibration function.

US Patent:

57925224, Aug 11, 1998

Filed:

Sep 18, 1996

Appl. No.:

8/715109

Inventors:

Shu Jin - Sunnyvale CA
Xiao Chun Mu - Saratoga CA
Xing Chen - Cambridge MA
Lawrence Bourget - Reading MA

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

H05H 130

US Classification:

427575

Abstract:

A method for forming a material in an opening on a substrate, such as a wafer, using an electron cyclotron resonance-assisted high density plasma physical vapor deposition system. The method comprises the steps of: maintaining a pressure in the range of approximately 1 mTorr to approximately 6 mTorr; generating a plasma by providing a microwave power in the range of approximately 3 kilowatts (kW) to approximately 5 kW; applying a direct current (DC) voltage to a target source of the material in the range of approximately (negative) -600 volts to approximately -1000 volts; providing a current of a predetermined amount to a first electromagnet; and providing a current to a second electromagnet that is less than said predetermined amount, wherein said second electromagnet is disposed below said first electromagnet; and forming a layer of the material in the opening.

US Patent:

55813500, Dec 3, 1996

Filed:

Jun 6, 1995

Appl. No.:

8/471997

Inventors:

Xing Chen - San Jose CA
Philip D. Flanner - Union City CA
Kiron B. Malwankar - Sunnyvale CA
Jennming Chen - Campbell CA

Assignee:

Tencor Instruments - Santa Clara CA

International Classification:

G01J 400

US Classification:

356369

Abstract:

A method for calibrating an ellipsometer, and an ellipsometer including a processor programmed to control the analyzer, polarizer, and other ellipsometer components, and to process the data measured by the ellipsometer to perform the calibration method automatically. Where the ellipsometer's polarizer rotates and the analyzer remains fixed during measurement, the method determines coarse approximations of values A. sub. 0 and P. sub. 0, and then processes reflectivity data obtained at two or more analyzer angles to determine refined approximations of the values A. sub. 0 and P. sub. 0, where P. sub. 0 is the angle of the polarizer's optical axis at an initial time, and A. sub. 0 is the offset of the actual orientation angle of the analyzer from a nominal analyzer angle. Preferably the ellipsometer is a spectroscopic ellipsometer, the reflectivity data determine a tan. psi. spectrum and a cos. DELTA.

US Patent:

62689169, Jul 31, 2001

Filed:

May 11, 1999

Appl. No.:

9/310017

Inventors:

Shing Lee - Fremont CA
Mehrdad Nikoonahad - Menlo Park CA
Xing Chen - San Jose CA

Assignee:

Kla-Tencor Corporation - San Jose CA

International Classification:

G01J 400
G01N 2100

US Classification:

356369

Abstract:

The surface of a doped semiconductor wafer is heated locally by means of a pump beam whose intensity is modulated at a first frequency. The heated area is sampled by a probe beam whose intensity is modulated at a second frequency. After the probe beam has been modulated (reflected or transmitted) at the first frequency by the wafer, the modulated probe beam is detected at a frequency equal to the difference between the harmonics of the first and second frequencies to determine dose of the dopants in the wafer. Such or similar type of instrument for measuring dose may be combined with an ellipsometer, reflectometer or polarimeter for measuring dose as well as thickness(es) and/or indices of refraction in a combined instrument for measuring the same sample.