Yen Ling Wang

US Patent:

7011710, Mar 14, 2006

Filed:

Apr 10, 2001

Appl. No.:

09/832168

Inventors:

Won Bang - Santa Clara CA, US
Yen Kun Wang - Fremont CA, US
Yeh Jen Kao - San Jose CA, US

Assignee:

Applied Materials Inc. - Santa Clara CA

International Classification:

C23C 16/00
C23F 1/00
H01L 21/306

US Classification:

118715, 118726, 118724, 15634537

Abstract:

Apparatus and method for delivering processing gas are provided. The apparatus for delivering processing gas from a vaporizer to a processing system comprises: a valve connected between the vaporizer and the processing system, the valve having a valve input connected to a vaporizer output and a first valve output connected to a processing system input and a second valve output connected to a bypass line; and a controller for switching the valve between the first valve output and the second valve output. The apparatus may further comprise: a second valve connected between a carrier gas source, a divert gas source and the vaporizer, the second valve having a first valve input connected to the carrier gas source, a second valve input connected to the divert gas source, and a valve output connected to a vaporizer input.