Yi Cao - Clinton NJ, US Muthiah Thiyagarajan - Bridgewater NJ, US SungEun Hong - Basking Ridge NJ, US DongKwan Lee - Bridgewater NJ, US Meng Li - Edison NJ, US David Mikrut - Staten Island NY, US
International Classification:
B32B 5/00 G03F 7/20 G03F 7/004
US Classification:
4281951, 430325, 4302701
Abstract:
A process for forming a double photoresist pattern is disclosed.