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Yi Cao

age ~42

from Forest Hills, NY

Also known as:
  • Yi Aen
  • Aen Yi

Yi Cao Phones & Addresses

  • Forest Hills, NY
  • Port Chester, NY
  • New Brunswick, NJ
  • New York, NY
  • Kenilworth, NJ
  • White Plains, NY

Us Patents

  • Composition For Coating Over A Photoresist Pattern

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  • US Patent:
    7745077, Jun 29, 2010
  • Filed:
    Jun 18, 2008
  • Appl. No.:
    12/141307
  • Inventors:
    Muthiah Thiyagarajan - Bridgewater NJ,
    Yi Cao - Clinton NJ,
    Sung Eun Hong - Basking Ridge NJ,
    Ralph R. Dammel - Flemington NJ,
  • Assignee:
    AZ Electronic Materials USA Corp. - Somerville NJ
  • International Classification:
    G03F 7/30
  • US Classification:
    430 14, 430313, 430330, 430331
  • Abstract:
    The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1),.
  • Composition For Coating Over A Photoresist Pattern Comprising A Lactam

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  • US Patent:
    7923200, Apr 12, 2011
  • Filed:
    Apr 9, 2007
  • Appl. No.:
    11/697804
  • Inventors:
    Muthiah Thiyagarajan - Bridgewater NJ,
    Ralph R. Dammel - Flemington NJ,
    Yi Cao - Bedminster NJ,
    SungEun Hong - Bedminster NJ,
    WenBing Kang - Kakegawa,
    Clement Anyadiegwu - Parlin NJ,
  • Assignee:
    AZ Electronic Materials USA Corp. - Somerville NJ
  • International Classification:
    G03F 7/40
  • US Classification:
    430313, 430 14, 430330, 430331
  • Abstract:
    The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1)The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
  • Composition For Coating Over A Photoresist Pattern

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  • US Patent:
    2012002, Feb 2, 2012
  • Filed:
    Jul 28, 2010
  • Appl. No.:
    12/845236
  • Inventors:
    Hengpeng Wu - Hillsborough NJ,
    Meng Li - Franklin Park NJ,
    Yi Cao - Clinton NJ,
    Jian Yin - Bridgewater NJ,
    DongKwan Lee - Bridgewater NJ,
    SungEun Hong - Basking Ridge NJ,
    Margareta Paunescu - Clinton NJ,
  • International Classification:
    G03F 7/20
    C09D 5/00
  • US Classification:
    430323, 10628711, 430325
  • Abstract:
    The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.
  • Composition For Coating Over A Photoresist Pattern Comprising A Lactam

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  • US Patent:
    2012021, Aug 30, 2012
  • Filed:
    Feb 24, 2011
  • Appl. No.:
    13/033912
  • Inventors:
    Muthiah Thiyagarajan - Bridgewater NJ,
    Ralph R. Dammel - Flemington NJ,
    Yi Cao - Bedminster NJ,
    SungEun Hong - Bedminster NJ,
    WenBing Kang - Kakegawa,
    Clement Anyadiegwu - Parlin NJ,
  • International Classification:
    G03F 7/26
  • US Classification:
    430331
  • Abstract:
    The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure ()where Ris independently selected hydrogen, C-Calkyl, C-Calkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH), represents the attachment to the polymer, m=1-6, and n=1-4.The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
  • Compositions Of Neutral Layer For Directed Self Assembly Block Copolymers And Processes Thereof

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  • US Patent:
    2013007, Mar 28, 2013
  • Filed:
    Sep 23, 2011
  • Appl. No.:
    13/243640
  • Inventors:
    Hengpeng WU - Hillsborough NJ,
    Yi CAO - Clinton NJ,
    SungEun HONG - Basking Ridge NJ,
    Jian YIN - Bridgewater NJ,
    Margareta PAUNESCU - Clinton NJ,
    Mark O. NEISSER - Whitehouse Station NJ,
    Guanyang LIN - Whitehouse Station NJ,
  • Assignee:
    AZ ELECTRONIC MATERIALS USA CORP. - SOMERVILLE NJ
  • International Classification:
    G03F 7/20
    C08L 33/12
  • US Classification:
    430296, 525210, 430325
  • Abstract:
    The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3)where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl moiety, C-Cpartially fluorinated alkyl, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3.
  • Methods And Materials For Removing Metals In Block Copolymers

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  • US Patent:
    2013023, Sep 12, 2013
  • Filed:
    Mar 9, 2012
  • Appl. No.:
    13/416669
  • Inventors:
    Jian YIN - Bridgewater NJ,
    Hengpeng WU - Hillsborough NJ,
    Muthiah THIYAGARAJAN - Bridgewater NJ,
    SungEun HONG - Basking Ridge NJ,
    Mark NEISSER - Whitehouse Station NJ,
    Yi CAO - Clinton NJ,
  • Assignee:
    AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. - SOMERVILLE NJ
  • International Classification:
    C08F 6/04
    B05D 3/10
    B05D 5/00
  • US Classification:
    216 58, 524562, 427271, 216 83
  • Abstract:
    The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.
  • Neutral Layer Polymer Composition For Directed Self Assembly And Processes Thereof

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  • US Patent:
    2013033, Dec 12, 2013
  • Filed:
    Jun 8, 2012
  • Appl. No.:
    13/492125
  • Inventors:
    Hengpeng WU - Hillsborough NJ,
    Orest POLISHCHUK - Bayonne NJ,
    Yi CAO - Clinton NJ,
    SungEun HONG - Basking Ridge NJ,
    Jian YIN - Bridgewater NJ,
    Guanyang LIN - Whitehouse Station NJ,
    Margareta PAUNESCU - Clinton NJ,
    Mark NEISSER - Whitehouse Station NJ,
  • Assignee:
    AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. - SOMERVILLE NJ
  • International Classification:
    C08F 220/10
    C07C 245/04
    G03F 7/20
    G03F 7/004
  • US Classification:
    4302701, 526216, 534886, 430322
  • Abstract:
    The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1):wherein Rrepresents a C-Csubstituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Ris a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.

Resumes

Yi Cao Photo 1

Sr.engineer At Seagate Technology

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Position:
Sr. Engineer at Seagate Technology, Sr.Engineer at Seagate Technology
Location:
United States
Industry:
Computer Hardware
Work:
Seagate Technology since Oct 2006
Sr. Engineer

Seagate Technology since Oct 2006
Sr.Engineer
Education:
Virginia Polytechnic Institute and State University 2004 - 2006
MS, Computer Science
Skills:
SCSI
SSD
Firmware
SATA
Debugging
Yi Cao Photo 2

Independent Fine Art Professional

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Location:
Greater New York City Area
Industry:
Fine Art
Yi Cao Photo 3

Yi Cao

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Location:
United States
Yi Cao Photo 4

Yi Cao

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Work:
NBCUniversal

2014 to 2000
QA
UX/UI Designer
2012 to 2000
NBCUniversal

2013 to 2013
NBCUniversal
New York, NY
2011 to 2012
UI/Visual Designer
NBC Sports
New York, NY
2011 to 2011
Visual Designer
Visual
New York, NY
2011 to 2011
UI Designer
Fashion Institute of Technology
New York, NY
2007 to 2011
Consumer Research - Credit Card Center

2004 to 2006
Education:
Shanghai University of Engineering Sciences
2001 to 2004
BS in Business Marketing
Yi Cao Photo 5

Yi Cao Highland Park, NJ

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Work:
ZK Technology LLC

Jan 2013 to 2000
Firmware/Embedded Software Developer
ZK Technology LLC
Piscataway, NJ
Jul 2011 to Dec 2012
Firmware Support & QA specialist
Illinois Institute of Technology

Aug 2010 to Jul 2011
Research Assistant
Nanjing University of Sci. & Tech

Aug 2009 to May 2010
Research Assistant
Education:
Illinois Institute of Technology
Chicago, IL
Jul 2010
M.S. in Electrical Engineering
Nanjing University of Sci. & Tech
Jun 2008
B.S. in Electrical Engineering
Skills:
MATLAB, C++, C, Java, python
Yi Cao Photo 6

Tax Analyst At Kaplan, Inc.

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Location:
Greater New York City Area
Industry:
Education Management
Yi Cao Photo 7

Freelance Web And Graphic Designer

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Location:
Greater New York City Area
Industry:
Design
Yi Cao Photo 8

Yi Cao

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Location:
United States

License Records

Yi Wei Cao

Address:
4248 147 St, Flushing, NY 11355
License #:
054073 - Active
Category:
Hairdresser
Issued Date:
Feb 18, 2005
Expiration Date:
Jul 31, 2018
Name / Title
Company / Classification
Phones & Addresses
Yi Feng Cao
YONG FA NY TRADING INC
44 Hester St APT 202, New York, NY 10002
Yi Feng Cao
NEW YORK ORIENTAL TRADING CO., INC
44 Henry St 202, New York, NY 10002
Yi J. Cao
Principal
Tobacco House of C.C.W. Inc
Nonclassifiable Establishments
13235 Sanford Ave, Flushing, NY 11355
Yi Qiang Cao
QIANG & LIN RESTAURANT INC
849 Bronx Riv Rd, Bronxville, NY 10708
132-35 Sanford Ave #3G, Flushing, NY 11355

Isbn (Books And Publications)

Control Structure Selection: For Plant-Wide Chemical Processes

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Author
Yi Cao

ISBN #
0863802117

Myspace

Yi Cao Photo 9

Yi Cao

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Locality:
NEW YORK, New York
Gender:
Female
Birthday:
1941
Yi Cao Photo 10

YI Cao

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Locality:
MONTREAL, Quebec
Gender:
Female
Birthday:
1910

Youtube

Ambrose Hsu 許紹洋- Hua Xiang 花香

Ambrose Hsu - Xu Shao Yang *Ambrose Hui 許紹洋- Hua Xiang 花香- Flower's Sc...

  • Category:
    Music
  • Uploaded:
    16 Sep, 2010
  • Duration:
    4m 27s

Sima Yi Kills Cao Cao [ENGLISH VERSION]

Sima Yi Kills

  • Category:
    Entertainment
  • Uploaded:
    18 Jun, 2008
  • Duration:
    1m 1s

Xun Yi Cao Zhi Lian - Eva Huang Sheng Yi

Chuyện tình Huân Y Thảo - Huỳnh Thánh Y

  • Category:
    Music
  • Uploaded:
    18 Sep, 2010
  • Duration:
    4m 30s

Facebook

Yi Cao Photo 11

Yi Cao

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Yi Cao Photo 12

Yi Cao

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Yi Cao Photo 13

Yi Cao

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Yi Cao Photo 14

Olivia Yi Cao

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Yi Cao Photo 15

Yi Cao

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Yi Cao Photo 16

Yi Cao

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Yi Cao Photo 17

Yi Cao

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Yi Cao Photo 18

Yi Cao

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Classmates

Yi Cao Photo 19

Yi Lei Cao

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Schools:
Westside High School Macon GA 2003-2007
Community:
Emmanuel Little, Chassidy Martin, Donna Aycock
Yi Cao Photo 20

Dr. Sun Yat Sen Intermedi...

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Graduates:
Yi Feng Cao (1992-1995),
Theresa Poon (1989-1992),
Ann Fitzgerald (1966-1968)
Yi Cao Photo 21

Benjamin Altman Public Sc...

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Graduates:
Yi Feng Cao (1985-1992),
Josephine Parry (1955-1960),
Mimi Cheung (1991-1997),
Peter Tsang (1964-1969)
Yi Cao Photo 22

Westside High School, Mac...

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Graduates:
Danyelle Butts (2001-2005),
Kenneth Ruth (2002-2006),
Malak Sudan (2005-2009),
Yi Lei Cao (2003-2007),
S Green (1992-1996)

Googleplus

Yi Cao Photo 23

Yi Cao

Work:
Nanjing University - Faculty (2011)
Education:
University of British Columbia - Chemistry, Nanjing University - Chemistry
Yi Cao Photo 24

Yi Cao

Education:
University of Iowa - Actuarial Science
Yi Cao Photo 25

Yi Cao (Wei Wei)

Education:
Conservatoire d'annecy - Piano performance
Yi Cao Photo 26

Yi Cao

Education:
University of New South Wales
Yi Cao Photo 27

Yi Cao

About:
Yi Cao Photo 28

Yi Cao

Yi Cao Photo 29

Yi Cao

Yi Cao Photo 30

Yi Cao


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