Yi Cao

US Patent:

7745077, Jun 29, 2010

Filed:

Jun 18, 2008

Appl. No.:

12/141307

Inventors:

Muthiah Thiyagarajan - Bridgewater NJ, US
Yi Cao - Clinton NJ, US
Sung Eun Hong - Basking Ridge NJ, US
Ralph R. Dammel - Flemington NJ, US

Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ

International Classification:

G03F 7/30

US Classification:

430 14, 430313, 430330, 430331

Abstract:

The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1),.

US Patent:

7923200, Apr 12, 2011

Filed:

Apr 9, 2007

Appl. No.:

11/697804

Inventors:

Muthiah Thiyagarajan - Bridgewater NJ, US
Ralph R. Dammel - Flemington NJ, US
Yi Cao - Bedminster NJ, US
SungEun Hong - Bedminster NJ, US
WenBing Kang - Kakegawa, JP
Clement Anyadiegwu - Parlin NJ, US

Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ

International Classification:

G03F 7/40

US Classification:

430313, 430 14, 430330, 430331

Abstract:

The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1)The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

US Patent:

20120028195, Feb 2, 2012

Filed:

Jul 28, 2010

Appl. No.:

12/845236

Inventors:

Hengpeng Wu - Hillsborough NJ, US
Meng Li - Franklin Park NJ, US
Yi Cao - Clinton NJ, US
Jian Yin - Bridgewater NJ, US
DongKwan Lee - Bridgewater NJ, US
SungEun Hong - Basking Ridge NJ, US
Margareta Paunescu - Clinton NJ, US

International Classification:

G03F 7/20
C09D 5/00

US Classification:

430323, 10628711, 430325

Abstract:

The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.

US Patent:

20120219919, Aug 30, 2012

Filed:

Feb 24, 2011

Appl. No.:

13/033912

Inventors:

Muthiah Thiyagarajan - Bridgewater NJ, US
Ralph R. Dammel - Flemington NJ, US
Yi Cao - Bedminster NJ, US
SungEun Hong - Bedminster NJ, US
WenBing Kang - Kakegawa, JP
Clement Anyadiegwu - Parlin NJ, US

International Classification:

G03F 7/26

US Classification:

430331

Abstract:

The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure ()where Ris independently selected hydrogen, C-Calkyl, C-Calkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH), represents the attachment to the polymer, m=1-6, and n=1-4.The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

US Patent:

20130078576, Mar 28, 2013

Filed:

Sep 23, 2011

Appl. No.:

13/243640

Inventors:

Hengpeng WU - Hillsborough NJ, US
Yi CAO - Clinton NJ, US
SungEun HONG - Basking Ridge NJ, US
Jian YIN - Bridgewater NJ, US
Margareta PAUNESCU - Clinton NJ, US
Mark O. NEISSER - Whitehouse Station NJ, US
Guanyang LIN - Whitehouse Station NJ, US

Assignee:

AZ ELECTRONIC MATERIALS USA CORP. - SOMERVILLE NJ

International Classification:

G03F 7/20
C08L 33/12

US Classification:

430296, 525210, 430325

Abstract:

The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3)where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl moiety, C-Cpartially fluorinated alkyl, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3.

US Patent:

20130233827, Sep 12, 2013

Filed:

Mar 9, 2012

Appl. No.:

13/416669

Inventors:

Jian YIN - Bridgewater NJ, US
Hengpeng WU - Hillsborough NJ, US
Muthiah THIYAGARAJAN - Bridgewater NJ, US
SungEun HONG - Basking Ridge NJ, US
Mark NEISSER - Whitehouse Station NJ, US
Yi CAO - Clinton NJ, US

Assignee:

AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. - SOMERVILLE NJ

International Classification:

C08F 6/04
B05D 3/10
B05D 5/00

US Classification:

216 58, 524562, 427271, 216 83

Abstract:

The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.

US Patent:

20130330668, Dec 12, 2013

Filed:

Jun 8, 2012

Appl. No.:

13/492125

Inventors:

Hengpeng WU - Hillsborough NJ, US
Orest POLISHCHUK - Bayonne NJ, US
Yi CAO - Clinton NJ, US
SungEun HONG - Basking Ridge NJ, US
Jian YIN - Bridgewater NJ, US
Guanyang LIN - Whitehouse Station NJ, US
Margareta PAUNESCU - Clinton NJ, US
Mark NEISSER - Whitehouse Station NJ, US

Assignee:

AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. - SOMERVILLE NJ

International Classification:

C08F 220/10
C07C 245/04
G03F 7/20
G03F 7/004

US Classification:

4302701, 526216, 534886, 430322

Abstract:

The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1):wherein Rrepresents a C-Csubstituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Ris a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.