Yong S Choi

Address:

18211 Kelly Blvd APT 533, Dallas, TX 75287

VIN:

5NMSH13EX7H059596

Make:

HYUN

Model:

SANT

Year:

2007

US Patent:

6627211, Sep 30, 2003

Filed:

Jul 24, 2000

Appl. No.:

09/624305

Inventors:

Yong Moon Choi - Towaco NJ
Lianli Li - Fresh Meadows NY
Kwon H. Kim - Bridgewater NJ

Assignee:

SK Corporation

International Classification:

A61F 1300

US Classification:

424434, 424 45, 514 78, 514975

Abstract:

A method of vehicle modulated administration of an anticonvulsive agent to the nasal mucous membranes of humans and animals is disclosed. The vehicle system is an aqueous pharmaceutical carrier comprising an aliphatic alcohol, a glycol and a biological surfactant such as a bile salt or a lecithin. The pharmaceutical composition provides a means to control and promote the rate and extent of transmucosal permeation and absorption of the medicaments via a single and multiple administration. Nasal administration of the pharmaceutical preparation produces a high plasma concentration of the anticonvulsant nearly as fast as intravenous administration. Such compositions are particularly suitable for a prompt and timely medication of patients in the acute and/or emergency treatment of status epilepticus and other fever-induced seizures.

US Patent:

7132112, Nov 7, 2006

Filed:

Aug 5, 2003

Appl. No.:

10/634689

Inventors:

Yong Moon Choi - Towaco NJ, US
Lianli Li - Fresh Meadows NY, US
Kwon H. Kim - Bridgewater NJ, US

Assignee:

SK Corporation

International Classification:

A61F 13/00
A61L 9/04

US Classification:

424434, 424 45

Abstract:

A novel method of vehicle modulated administration of an anticonvulsive agent to the mucous membranes of humans and animals is disclosed. The vehicle system is an aqueous pharmaceutical carrier comprising an aliphatic alcohol (10–80%) or a glycol (10–80%), and their combinations with a biological surfactant such as a bile salt or a lecithin. The pharmaceutical composition provides a means to control and promote the rate and extent of transmucosal permeation and absorption of the medicaments via a single and multiple administration. Nasal administration of the pharmaceutical preparation produces a high plasma concentration of the anticonvulsant nearly as fast as intravenous administration. Such compositions are particularly suitable for a prompt and timely medication of patients in the acute and/or emergency treatment of status epilepticus and other fever-induced seizures.

US Patent:

7446127, Nov 4, 2008

Filed:

Aug 26, 2004

Appl. No.:

10/926615

Inventors:

Yong Moon Choi - Pine Brook NJ, US
Hunwoo Shin - Livingston NJ, US
Palanichamy Ilankumaran - Pinerbrook NJ, US
Hong Wook Kim - Lincoln Park NJ, US

Assignee:

SK Holdings Co, Ltd. - Seoul

International Classification:

A01N 43/16
C07D 263/30

US Classification:

514458, 548235

Abstract:

There are disclosed derivatives of 3-chromancarboxylic acid represented by formula I.

US Patent:

7456293, Nov 25, 2008

Filed:

Mar 28, 2006

Appl. No.:

11/391031

Inventors:

Yong Moon Choi - Pinebrook NJ, US
Hunwoo Shin - Livingston NJ, US
Palanichamy Ilankumaran - Pinebrook NJ, US

Assignee:

SK Holding Co., Ltd - Seoul

International Classification:

A61K 31/4184
C07D 235/04

US Classification:

5483101, 514394

Abstract:

The present invention is concerned with racemic or enantiomerically enriched substituted carboxylic acids and derivatives thereof represented by Formula 1;.

US Patent:

7569486, Aug 4, 2009

Filed:

May 9, 2007

Appl. No.:

11/746217

Inventors:

Yong Seok Choi - Mckinney TX, US
Jeannette Michelle Jacques - Rowlett TX, US

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H01L 21/311
H01L 23/48
H01L 23/52
H01L 29/40

US Classification:

438702, 257774, 257E21229

Abstract:

A system and method of preventing pattern lifting during a trench etch/clean process is disclosed. A first layer comprising a first dip is formed over a first via pattern. A trench resist layer is formed. The trench resist layer is patterned with a trench reticle to produce a second via pattern in the trench resist layer over the first via pattern. A photo resist over the first via pattern is opened during a trench processing. Thus, an additional pattern added on a trench pattern reticle is used to open, i. e. , remove resist over, a huge via feature area causing under layer dip.

US Patent:

7598279, Oct 6, 2009

Filed:

Apr 20, 2006

Appl. No.:

11/407526

Inventors:

Yong Moon Choi - Pinebrook NJ, US
Choon-Gil Kim - Daejon, KR
Han-Ju Yi - Daejeon, KR
Young-Sun Kang - Daejeon, KR
Hyun-Seok Lee - Daejeon, KR

Assignee:

SK Holdings Co., Ltd. - Seoul

International Classification:

A61K 31/445
C07D 401/12
C07D 249/08
C07D 249/04

US Classification:

514359, 514281, 514283, 548250, 548255, 5482622

Abstract:

Azole compounds containing carbamoyl group and pharmaceutically useful salts thereof are described. The compounds are effective anticonvulsants which are used in the treatment of disorders of the central nervous system, especially as anxiety, depression, convulsion, epilepsy, migraine, bipolar disorder, drug abuse, smoking, ADHD, obesity, sleep disorder, neuropathic pain, stroke, cognitive impairment, neurodegeneration, stroke and muscle spasm.

US Patent:

7811942, Oct 12, 2010

Filed:

Aug 22, 2007

Appl. No.:

11/843361

Inventors:

Jeannette Michelle Jacques - Rowlett TX, US
Yong Seok Choi - Mckinney TX, US

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H01L 21/302
H01L 21/461

US Classification:

438725, 216 47, 216 67, 438694, 4302701

Abstract:

Exemplary embodiments provide a tri-layer resist (TLR) stack used in a photolithographic process, and methods for resist reworking by a single plasma etch process. The single plasma etch process can be used to remove one or more portions/layers of the TLR stack that needs to be reworked in a single process. The removed portions/layers can then be re-formed and resulting in a reworked TLR stack for subsequent photo-resist (PR) processing. The disclosed plasma-etch resist rework method can be a fast, simple, and cost effective process used in either single or dual damascene tri-layer patterning processes for the fabrication of, for example, sub 45-nm node semiconductor structures.

US Patent:

7824829, Nov 2, 2010

Filed:

Jun 27, 2007

Appl. No.:

11/769436

Inventors:

Yong Seok Choi - Mckinney TX, US

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

G03F 9/00
G03C 5/00

US Classification:

430 30, 430313

Abstract:

The present disclosure is directed to a method for monitoring focus of a photolithography system. The method comprises providing a substrate and depositing a photoresist layer on the substrate. At least one photomask is provided comprising one or more forbidden pitch photomask patterns formed thereon. The forbidden pitch patterns are imaged in the photoresist layer by exposing the photoresist layer to radiation through the at least one photomask. The imaged forbidden pitch patterns are developed in the photoresist. Focus error information regarding the imaging process can be determined using the developed forbidden pitch patterns.