Yong Wei Liu

US Patent:

6362464, Mar 26, 2002

Filed:

Feb 15, 2000

Appl. No.:

09/504543

Inventors:

Yong Liu - San Marino CA
Rongsheng Li - Hacienda Heights CA
Christopher L. Rice - Lawndale CA

Assignee:

Hughes Electronics Corp. - El Segundo CA

International Classification:

G01C 2102

US Classification:

2502061, 2502036, 244171

Abstract:

An apparatus for determining stellar inertial attitude based upon a plurality of stars includes a star tracker and a controller. The star tracker is used to sense the positions of stars and generate signals corresponding to the positions of the stars as seen in its field of view. The controller checks a star catalog and actively determines which stars to track. The controller does this determination in terms of each stars relative geometry. The controller then commands the star tracker to track these stars and uses them to determine the spacecraft attitude.

US Patent:

6670082, Dec 30, 2003

Filed:

Oct 9, 2001

Appl. No.:

09/974507

Inventors:

Yong Liu - Fremont CA
Hua-Yu Liu - Palo Alto CA

Assignee:

Numerical Technologies, Inc. - Mountain View CA

International Classification:

G03F 900

US Classification:

430 5, 716 19

Abstract:

An accurate, cost-effective system and method for correcting 3D effects on an alternating phase-shifting mask (PSM) is provided. To facilitate this correction, a library can be built to include a first group of 180 degree phase-shifting regions, wherein these regions have a common first size. Based on this first size, 3D simulation is performed. A transmission and a phase are altered in a 2D simulation based on this first size until a shape dependent transmission and a shape dependent phase allow the 2D simulation to substantially match the 3D simulation. Finally, a modified first size is chosen using the shape dependent transmission and the shape dependent phase such that a 2D simulation based on the modified first size substantially matches the 3D simulation based on the first size. The library associates the first size with the modified first size, the shape dependent transmission, and the shape dependent phase.

US Patent:

6830854, Dec 14, 2004

Filed:

Oct 14, 2003

Appl. No.:

10/685751

Inventors:

Yong Liu - Fremont CA
Hua-Yu Liu - Palo Alto CA

Assignee:

Numerical Technologies, Inc. - Mountain View CA

International Classification:

G03F 900

US Classification:

430 5

Abstract:

An accurate, cost-effective system and method for correcting 3D effects on an alternating phase-shifting mask (PSM) is provided. To facilitate this correction, a library can be built to include a first group of 180 degree phase-shifting regions, wherein these regions have a common first size. Based on this first size, 3D simulation is performed. A transmission and a phase are altered in a 2D simulation based on this first size until a shape dependent transmission and a shape dependent phase allow the 2D simulation to substantially match the 3D simulation. Finally, a modified first size is chosen using the shape dependent transmission and the shape dependent phase such that a 2D simulation based on the modified first size substantially matches the 3D simulation based on the first size. The library associates the first size with the modified first size, the shape dependent transmission, and the shape dependent phase.

US Patent:

7724188, May 25, 2010

Filed:

May 23, 2008

Appl. No.:

12/126134

Inventors:

Yong Liu - San Marino CA, US

Assignee:

The Boeing Company - Chicago IL

International Classification:

H01Q 3/00

US Classification:

342359

Abstract:

Gimbal system angle compensation methods and systems are provided. A particular method includes pointing an antenna at a first target using an initial set of at least four gimbal angles and determining first bore sight pointing errors resulting from a pointing direction of the antenna relative to the first target. The method also includes estimating values of a plurality of independently observable error variables based on the first bore sight pointing errors. The method further includes determining a set of gimbal angle corrections based on the values of the plurality of independently observable error variables.

US Patent:

7793253, Sep 7, 2010

Filed:

Oct 4, 2006

Appl. No.:

11/538782

Inventors:

Daniel S. Abrams - Mountain View CA, US
Danping Peng - Fremont CA, US
Yong Liu - Fremont CA, US
Paul Rissman - Palo Alto CA, US

Assignee:

Luminescent Technologies, Inc. - Palo Alto CA

International Classification:

G06F 17/50

US Classification:

716 19, 716 21

Abstract:

A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern that includes at least one continuous feature is provided. Then a mask pattern that includes a plurality of distinct types of regions corresponding to the distinct types of regions of the photo-mask is determined. Note that the mask pattern includes at least two separate features corresponding to at least the one continuous feature. Furthermore, at least the two separate features are separated by a spacing having a length and the spacing overlaps at least a portion of at least the one continuous feature.

US Patent:

8082525, Dec 20, 2011

Filed:

Apr 14, 2009

Appl. No.:

12/423693

Inventors:

Yong Liu - Fremont CA, US
John F. McCarty - Redwood City CA, US
Kelly Gordon Russell - Santa Clara CA, US
Linyong Pang - Palo Alto CA, US

Assignee:

Luminescent Technologies, Inc. - Palo Alto CA

International Classification:

G06F 17/50
G06F 19/00
G03F 1/00
G21K 5/00

US Classification:

716 52, 716 53, 716 54, 716 55, 716111, 700120, 700121, 430 5, 378 35

Abstract:

Embodiments of a method for determining a mask pattern to be used on a photo-mask in a lithography process are described. This method may be performed by a computer system. During operation, this computer system receives at least a portion of a first mask pattern including first regions that violate pre-determined rules associated with the photo-mask. Next, the computer system determines a second mask pattern based on at least the portion of the first mask pattern, where the second mask pattern includes second regions that are estimated to comply with the pre-determined rules. Note that the second regions correspond to the first regions, and the second mask pattern is determined using a different technique than that used to determine the first mask pattern.

US Patent:

8211747, Jul 3, 2012

Filed:

Dec 13, 2011

Appl. No.:

13/323979

Inventors:

Dan Kinzer - El Segundo CA, US
Yong Liu - Scarborough ME, US
Stephen Martin - South Portland ME, US

Assignee:

Fairchild Semiconductor Corporation - San Jose CA

International Classification:

H01L 21/00

US Classification:

438108, 257401, 257500, 257724, 257774, 257E23169, 257E2706

Abstract:

This document discusses, among other things, apparatus and methods for an IC package including first and a second discrete components fabricated into a semiconductor substrate. The first and second discrete components can be adjacent to one another in the semiconductor substrate, and an integrated circuit die can be mounted on the semiconductor substrate and coupled to the first and second discrete components.

US Patent:

8229449, Jul 24, 2012

Filed:

Jul 3, 2008

Appl. No.:

12/167980

Inventors:

Yong Liu - Santa Clara CA, US
Chiu Ngo - San Francisco CA, US

Assignee:

Samsung Electronics Co., Ltd. - Suwon

International Classification:

H04W 72/00
H04B 3/36
H04B 7/14

US Classification:

4554522, 455453, 455 7, 370315

Abstract:

A method and system for allocating subcarrier frequency resources for a relay enhanced cellular communication system is provided. The relay enhanced cellular communication system includes a base station, one or more mobile stations and one or more relay stations. Subcarrier allocation involves assigning a set of subcarriers by allocating subcarriers to one or more access communication links between mobile stations and their serving stations, to meet minimum data rate requirements of the access links, and allocating subcarriers to one or more relay communication links between the base station and relay stations to accommodate the data rates achieved on the corresponding access links. The serving stations may include one or more relay stations and the base station. Link balancing, multi-user diversity and minimum data rate constraint are jointly considered to achieve an optimal solution.