Hai Deng - Mountain View CA, US Yueh Wang - Portland OR, US Hok-Kin Choi - San Jose CA, US Robert M. Meagley - Hillsboro CA, US Ernisse Putna - Beaverton OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G03B 27/54
US Classification:
355 67
Abstract:
Compositions for immersion liquid materials and associated immersion lithography systems and techniques. Examples of polymer or oligomer-based immersion liquids are described to exhibit superior material properties for immersion lithography in comparison with water and some other commonly-used immersion liquids. In addition, certain material additives may be added to water and water-based immersion liquids to improve the performance of the immersion liquids in immersion lithography.