Yueh O Wang

US Patent:

7391501, Jun 24, 2008

Filed:

Jan 22, 2004

Appl. No.:

10/763467

Inventors:

Hai Deng - Mountain View CA, US
Yueh Wang - Portland OR, US
Hok-Kin Choi - San Jose CA, US
Robert M. Meagley - Hillsboro CA, US
Ernisse Putna - Beaverton OR, US

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

G03B 27/54

US Classification:

355 67

Abstract:

Compositions for immersion liquid materials and associated immersion lithography systems and techniques. Examples of polymer or oligomer-based immersion liquids are described to exhibit superior material properties for immersion lithography in comparison with water and some other commonly-used immersion liquids. In addition, certain material additives may be added to water and water-based immersion liquids to improve the performance of the immersion liquids in immersion lithography.