Zheng Yan

US Patent:

6845108, Jan 18, 2005

Filed:

May 14, 2002

Appl. No.:

10/146653

Inventors:

Jian Liu - Mountain View CA, US
Yue Chen - Palo Alto CA, US
Zheng Yan - San Jose CA, US
Hong Lin - Palo Alto CA, US

Assignee:

Calmar Optcom, Inc. - Sunnyvale CA

International Classification:

H01S 310

US Classification:

372 20, 372 26, 372 2901, 372 2902

Abstract:

Techniques and designs for tunable and dynamically stabilized a laser wavelength in various lasers, including fiber lasers and actively mode-locked lasers. In an actively mode-locked laser, a dynamic wavelength tuning control and a dynamic cavity length control are implemented to maintain mode locking during tuning of the laser wavelength.

US Patent:

7564544, Jul 21, 2009

Filed:

Jan 23, 2007

Appl. No.:

11/626102

Inventors:

Guoheng Zhao - Milpitas CA, US
Zheng Yan - San Jose CA, US
Bo Li - Palo Alto CA, US
Wayne Chen - Palo Alto CA, US

Assignee:

3i Systems Corporation - Sunnyvale CA

International Classification:

G01N 21/00

US Classification:

3562372, 3562375

Abstract:

The radiation beam of discrete light source such as LEDs is shaped by a cylindrical lens and a spherical lens to form two perpendicular narrow lines to illuminate a surface. The first line is projected onto a sample surface to improve illumination efficiency, and the second line is projected onto a pupil plane of an imaging lens to improve illumination uniformity. The layout of the LED chip is optimized to match the aspect ratio of the imaging detector. Multiple LEDs at different wavelengths are combined to improve sensitivity. The full surface of the sample is inspected through the relative motion between the sample and the optics.

US Patent:

7714996, May 11, 2010

Filed:

Mar 5, 2007

Appl. No.:

11/714513

Inventors:

Zheng Yan - Sunnyvale CA, US
Bo Li - Sunnyvale CA, US
Wayne Chen - Sunnyvale CA, US
Tony Young - Sunnyvale CA, US
Ning Li - Sunnyvale CA, US
Jianbo Gao - Sunnyvale CA, US

Assignee:

3i Systems Corporation - Santa Clara CA

International Classification:

G01N 21/00

US Classification:

3562371, 3562375

Abstract:

Automatic optical inspection (AOI) systems are described comprising optical modules that include an illumination component and a lens array configured to direct illumination of the illumination component at a portion of a substrate. The lens array includes a Fresnel lens. The optical module includes a camera that receives reflected light resulting from an interaction of the illumination and the substrate. The camera includes a time delay integration (TDI) sensor. A telecentric imaging lens directs reflected light from the substrate to the camera. The illumination component comprises a controller coupled to multiple LED light sources, each emitting light at a different wavelength. The controller independently controls each LED light source. The illumination component includes a bright field and/or a dark field light source. The illumination component can include a front side and/or a back side light source.

US Patent:

6633371, Oct 14, 2003

Filed:

Jun 26, 2002

Appl. No.:

10/185539

Inventors:

Tongxin Lu - San Jose CA
Zheng Yan - San Jose CA

Assignee:

Alliance Fiber Optic Products, Inc. - Sunnyvale CA

International Classification:

G01N 2100

US Classification:

356 72

Abstract:

Method and apparatus for wavelength control and measurement are disclosed. An optical signal to be measured is tapped off a portion thereof referring to as a source signal. Together with a reference signal, the source signal is coupled to a tunable filter. The frequency response or passing band of the tunable filter is so controlled that one wavelength from the source signal and one wavelength from the reference signal transmit through. Relying on a band separation filter, the wavelength is separated from the reference signal and coupled to a gas cell of a known spectrum, a filtered signal of the wavelength is then coupled to a photo-detector for subsequent electrical measurement. In accordance with the known spectrum, the wavelength can be precisely derived.

US Patent:

20220300745, Sep 22, 2022

Filed:

Mar 18, 2021

Appl. No.:

17/205314

Inventors:

- Grand Cayman, KY
Weixin Jiang - Guangzhou City, CN
Zheng Yan - Fremont CA, US

International Classification:

G06K 9/00
B60W 60/00

Abstract:

A computing system includes one or more processors and a memory storing instructions that, when executed by the one or more processors, cause the system to perform operations. The operations include obtaining sensor data from a sensor of a vehicle, the sensor data including point cloud frames at different positions, orientations, and times, the sensor data used to generate a map, determining a position and an orientation of the sensor corresponding to a capture of each of the point cloud frames according to a simultaneous localization and mapping (SLAM) algorithm, and depicting, on an interface, a graphical illustration of the determined positions at which the point cloud frames were captured.

US Patent:

20210240760, Aug 5, 2021

Filed:

Jan 31, 2020

Appl. No.:

16/779519

Inventors:

- Bentonville AR, US
Behzad Ahmadi - San Jose CA, US
Cun Mu - Jersey City NJ, US
Zheng Yan - Short Hills NJ, US
Guang Yang - Jersey City NJ, US
Jun Zhao - Jersey City NJ, US

Assignee:

Walmart Apollo, LLC - Bentonville AR

International Classification:

G06F 16/56
G06F 16/901
G06F 16/583
G06F 16/532
G06Q 30/06

Abstract:

A method including bit-operation and sub-code/substring filtering for image searching using a full-text search engine. The method can include determining a first binary vector of first binary substrings for a first image. The method also can include obtaining a respective second binary vector comprising second binary substrings for each of second images from a database. The method additionally can include determining a respective sub string distance for each of the binary substring for each of the second images. The respective substring distance can be between at least a pair of a first binary sub string of the first binary sub strings of the first binary vector and a respective corresponding second binary sub string of the second binary sub strings of the respective second binary vector for each of the second images. In some embodiments, the method further can include after determining the respective sub string distance for each of the binary sub string for each of the second images, when the respective sub string distance for one or more of the second images is not greater than a predetermined substring distance threshold, including the one or more of the second images in a search result. The method also can include determining a respective image distance for each respective third image of the search result, the respective image distance being between the first image and each respective third image of the search result. The method additionally can include after determining the respective image distance for the each respective third image of the search result, when the respective image distance is less than the predetermined image distance threshold, culling the each respective third image from the search result. Other embodiments are disclosed.

US Patent:

20180286643, Oct 4, 2018

Filed:

Mar 29, 2017

Appl. No.:

15/472494

Inventors:

- Minato-ku, JP
Xinkang Tian - Fremont CA, US
Ching-Ling Meng - Sunnyvale CA, US
Vi Vuong - Fremont CA, US
Wen Jin - Fremont CA, US
Zheng Yan - San Jose CA, US
Mihail Mihaylov - San Jose CA, US

Assignee:

Tokyo Electron Limited - Minato-ku

International Classification:

H01J 37/32
H01L 21/67
H01L 21/3065
H01L 21/66
G01N 21/31
G06N 99/00

Abstract:

An apparatus, system, and method for in-situ etching monitoring in a plasma processing chamber. The apparatus includes a continuous wave broadband light source; an illumination system configured to illuminate an area on a substrate with an incident light beam having a fixed polarization direction, the incident light beam from the broadband light source being modulated by a shutter; a collection system configured to collect a reflected light beam being reflected from the illuminated area on the substrate, and direct the reflected light beam to a detector; and processing circuitry. The processing circuitry is configured to process the reflected light beam to suppress background light, determine a property value from the processed light, and control an etch process based on the determined property value.

US Patent:

20170140905, May 18, 2017

Filed:

Nov 15, 2016

Appl. No.:

15/351916

Inventors:

- Tokyo, JP
Xinkang Tian - Fremont CA, US
Ching-Ling Meng - Sunnyvale CA, US
Jason Ferns - Sunnyvale CA, US
Joel Ng - San Leandro CA, US
Badru D. Hyatt - Fremont CA, US
Zheng Yan - San Jose CA, US
Vi Vuong - Fremont CA, US

International Classification:

H01J 37/32
G01J 1/42
G01J 3/28

Abstract:

An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.