Alex B Fong

US Patent:

8389084, Mar 5, 2013

Filed:

Feb 27, 2009

Appl. No.:

12/395510

Inventors:

Regan Nayve - San Jose CA, US
Darren T. Imai - Los Gatos CA, US
Alex F. Fong - San Jose CA, US

Assignee:

FUJIFILM Corporation - Tokyo

International Classification:

B32B 1/00
B32B 1/02
B32B 15/04
B32B 15/08
B32B 15/092
H02K 41/02

US Classification:

428 357, 428 358, 428 341, 310 1203

Abstract:

A fluid impermeable protective layer is described for a structure that has a 3-dimensional profile. The 3-dimensional profile can include actuators. The protective layer is applied so that there are no breaches in the protective layer and so that the protective layer is not too thick to prevent the actuators from being able to properly function.

US Patent:

20090207399, Aug 20, 2009

Filed:

Dec 19, 2008

Appl. No.:

12/318035

Inventors:

Alex F. Fong - San Jose CA, US
Henricus Wilhelmus Maria Van Buel - s-Hertogenbosch, NL
Joseph J. Consolini - Costa Mesa CA, US
Michael Josephus Evert Van De Moosdijk - Eindhoven, NL
Michael Charles Robles - Santa Cruz CA, US

Assignee:

ASML NETHERLANDS B.V. - Veldhoven
ASML Holding NV - Veldhoven

International Classification:

G03B 27/58
G01B 11/00

US Classification:

355 72, 356401

Abstract:

A method of calibrating a front to backside alignment capable lithographic apparatus. The method includes attaching a substrate having a plurality of alignment marks to a carrier, the substrate being arranged such that the alignment marks face towards the carrier; reducing the thickness of the substrate; using an alignment system of the apparatus to measure the positions of images of alignment marks formed by optics in a substrate table of the apparatus; projecting a pattern onto the substrate, the position of the pattern being determined according to the measured positions of the alignment marks; measuring the positions of the projected pattern and the alignment marks provided on the opposite side of the substrate, the position of the alignment marks provided on the opposite side of the substrate being measured by the alignment system directing radiation through the substrate; and comparing the measured positions in order to determine an overlay error.

US Patent:

D497980, May 11, 1999

Filed:

Sep 27, 1997

Appl. No.:

D/076333

Inventors:

Alex B Fong - San Leandro CA

International Classification:

2803

US Classification:

D28 65

US Patent:

58710213, Feb 16, 1999

Filed:

Oct 27, 1997

Appl. No.:

8/957844

Inventors:

Alex B. Fong - San Leandro CA

International Classification:

A61C 1500

US Classification:

132323

Abstract:

A dental flossing apparatus, comprising a length of dental floss having two ends and two floss holders. One floss holder is attached to each end of the dental floss. Each floss holder comprises a flat piece of plastic having an edge with a continuous groove therein. The groove allows dental floss to be wrapped around the floss holder. Each floss holder is molded around one end of the dental floss, forming a very secure bond between the floss and the holder.