Christopher Edward Obszarny

US Patent:

6429667, Aug 6, 2002

Filed:

Jun 19, 2000

Appl. No.:

09/597921

Inventors:

Christopher P. Ausschnitt - Brookfield CT
Christopher E. Obszarny - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01R 2708

US Classification:

324699, 324716, 324719

Abstract:

A monitor for electrically testing energy beam dose or focus of a layer formed on a substrate by lithographic processing. The monitor comprises a substrate having in a lithographically formed layer an array of electrically conductive elements comprising a plurality of spaced, substantially parallel elements having a length and a width, with the individual elements being electrically connected, and the lengths of the elements being sensitive to dose and focus of an energy beam in lithographically forming the layer. The monitor further includes at least one pad electrically connected to the array to apply current through the array elements. Upon applying a voltage across the array elements, the suitability of dose or focus of the lithographically formed layer may be determined by the resistance of the array. Preferably, ends of the individual elements are aligned along essentially straight lines to form an array edge.

US Patent:

20050273372, Dec 8, 2005

Filed:

Jun 3, 2004

Appl. No.:

10/709884

Inventors:

James Bowne - Poughkeepsie NY, US
Christopher Obszarny - Poughkeepsie NY, US

Assignee:

INTERNATIONAL BUSINESS MACHINES CORPORATION - Armonk NY

International Classification:

G06F017/60

US Classification:

705005000

Abstract:

An automated system and method for organizing and scheduling meetings is described whereby, under a single integrated interface, a meeting organizer can identify a list of invitees from an address book database, select a meeting location from a hierarchical locations database, and identify meeting resources from a hierarchical resource database. Candidate meeting locations can be organized hierarchically by location (e.g., state, town, building, room) or by organization (company, division, campus, building, etc.) and can be selected by searching the locations database for meeting locations that satisfy search criteria based upon address book information (e.g., location) associated with the list of invitees. Resources can be similarly identified by searching the resource database for requested resources that satisfy search criteria based upon the selected meeting location (e.g., requested resources that are available at that location). Schedule management, meeting location reservations, and resource management are all integrated. Meeting times can be determined by selecting times when the invitees, meeting location and requested resources are all simultaneously available.

US Patent:

20120176315, Jul 12, 2012

Filed:

Jan 10, 2011

Appl. No.:

12/987182

Inventors:

Steven Alan Cordes - Yorktown Heights NY, US
Debra C. Leach - Hopewell Junction NY, US
Debra Ann Loussedes - Hopewell Junction NY, US
Christopher Edward Obszarny - Hopewell Junction NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 3/033

US Classification:

345161

Abstract:

A user input device includes a base that has a top surface. Flexibly attached to the base is a joystick. Character indicia are displayed on the base, and each indicium corresponds to a unique joystick position or motion sequence. The user input device has a processor and non-volatile memory that stores machine-readable instructions, that when executed by the processor, transmit a code associated with the unique joystick position or motion sequence.

US Patent:

59050195, May 18, 1999

Filed:

Sep 26, 1997

Appl. No.:

8/943089

Inventors:

Christopher E. Obszarny - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F7/20

US Classification:

430327

Abstract:

The present invention utilizes a sub-threshold exposure step on an optically sensitive resist that is applied to a semiconductor wafer to thin the resist below the thickness which can be achieved by normal spinning and/or thinning techniques. Furthermore, the thinned resist can be re-expose to UV energies so as to develop patterns on the surface of the semiconductor wafer. An apparatus for vibrating and rotating the resist during the sub-threshold step is also disclosed herein.

US Patent:

61633674, Dec 19, 2000

Filed:

Jul 16, 1998

Appl. No.:

9/116395

Inventors:

Christopher E. Obszarny - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03B 2742
G03B 2772
F21V 914

US Classification:

355 53

Abstract:

An adjustable, in-situ photolithography process is taught, where incident exposure light is passed through two polarizers; the first polarizer capable of altering its polarization direction, during exposure, relative to the polarization direction of the second polarizer, in order to enhance the contrast of a patterned image projected on a semiconductor wafer. The second polarizer in the optical train is a photo mask transparent substrate impregnated with colloidal crystals that are aligned in a fixed, predetermined direction by magnetic field. The photo mask may also contain a silicon compound for phase shifting the incident exposure light to further enhance the image contrast.

US Patent:

61769673, Jan 23, 2001

Filed:

Sep 16, 1998

Appl. No.:

9/154271

Inventors:

Christopher E. Obszarny - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C23F 102

US Classification:

156345

Abstract:

Disclosed are shielding platters for semiconductor wafers, and more particularly a reactive ion etch (RIE) chamber wafer masking system, wherein a mechanical mask facilitates the implementation of multiple etches on a single semiconductor wafer.

US Patent:

61276863, Oct 3, 2000

Filed:

Jan 11, 1999

Appl. No.:

9/229087

Inventors:

Christopher E. Obszarny - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G21K 500

US Classification:

2504922

Abstract:

The present invention utilizes a sub-threshold exposure step on an optically sensitive resist that is applied to a semiconductor wafer to thin the resist below the thickness which can be achieved by normal spinning and/or thinning techniques. Furthermore, the thinned resist can be re-expose to UV energies so as to develop patterns on the surface of the semiconductor wafer. An apparatus for vibrating and rotating the resist during the sub-threshold step is also disclosed herein.