David R Ferris

US Patent:

7449416, Nov 11, 2008

Filed:

Sep 1, 2005

Appl. No.:

11/217247

Inventors:

Alan F. Becknell - Ellicott City MD, US
Philip Hammar - Chevy Chase MD, US
David Ferris - Rockville MD, US

Assignee:

Axcelis Technologies, Inc. - Beverly MA

International Classification:

H01L 21/302

US Classification:

438725, 438710

Abstract:

A plasma ashing process for removing photoresist material and post etch residues from a substrate comprising carbon, hydrogen, or a combination of carbon and hydrogen, wherein the substrate comprises a low k dielectric layer, the process comprising forming a plasma from an essentially oxygen free and nitrogen free gas mixture; introducing the plasma into a process chamber, wherein the process chamber comprises a baffle plate assembly in fluid communication with the plasma; flowing the plasma through the baffle plate assembly and removing photoresist material, post etch residues, and volatile byproducts from the substrate; periodically cleaning the process chamber by introducing an oxygen plasma into the process chamber; and cooling the baffle plate assembly by flowing a cooling gas over the baffle plate assembly. A process chamber adapted for receiving downstream plasma, the process chamber comprising an upper baffle plate comprising at least one thermally conductive standoff in thermal communication with a wall of the process chamber; and a lower baffle plate spaced apart from the upper baffle plate.

US Patent:

8580076, Nov 12, 2013

Filed:

May 22, 2003

Appl. No.:

10/249962

Inventors:

Alan Frederick Becknell - Ellicott City MD, US
Thomas James Buckley - Ijamsville MD, US
David Ferris - Rockville MD, US
Aseem Kumar Srivastava - Germantown MD, US
Carlo Waldfried - Falls Church VA, US

Assignee:

LAM Research Corporation - Fremont CA

International Classification:

H01L 21/3065
C23C 16/00
C23C 16/4412
C23C 16/455
C23C 16/45561
C23C 16/45563
C23C 16/46
C23C 16/505
C23C 16/511

US Classification:

15634525, 15634529, 15634533, 15634534, 15634535, 15634536, 15634541, 15634548, 15634542, 118715, 118723 MW, 118723 ME, 118723 I, 118723 IR, 118725

Abstract:

A plasma apparatus, various components of the plasma apparatus, and an oxygen free and nitrogen free processes for effectively removing photoresist material and post etch residues from a substrate with a carbon and/or hydrogen containing low k dielectric layer(s).

US Patent:

46836365, Aug 4, 1987

Filed:

Nov 13, 1984

Appl. No.:

6/670695

Inventors:

James A. Henderson - Finksburg MD
Constantine M. Travlos - Baltimore MD
David S. Ferris - Annapolis MD
Gerald J. Duddy - Thousand Oaks CA
Roland F. Mercier - Los Angeles CA

Assignee:

Westinghouse Electric Corp. - Pittsburgh PA

International Classification:

B23P 2300

US Classification:

295646

Abstract:

A system for accepting conventional wire in bulk form, cutting the wire into predetermined lengths and preparing the ends of the wire for use in conventional wire harnesses is disclosed. More specifically, the system accepts as input data, in digital form, which fully describes each wire to be formed. Individual wires having the required length are cut from wire provided in bulk form. As each section of wire is measured and cut, it is stored in individual containers and the ends of each section is secured by a clamp. A transport system sequentially transports the stored wires to workstations where conventional wire preparation tasks such as stripping, marking and attachment of terminals are performed. After all wire preparation functions have been performed, the individual wires are removed from their containers and utilized in forming wire harnesses.

US Patent:

45693005, Feb 11, 1986

Filed:

May 4, 1984

Appl. No.:

6/607099

Inventors:

David S. Ferris - Annapolis MD
Rosario Gulino - Severna Park MD
Robert F. Mons - Annapolis MD

Assignee:

Westinghouse Electric Corp. - Pittsburgh PA

International Classification:

F42B 1900

US Classification:

114 20R

Abstract:

A torpedo having a nose section wherein the entire nose section is of a porous material. The volume behind the nose is divided into a plurality of annular chambers and a fluid delivery system provides filtered sea water to the chambers for expulsion through the porous nose. The filtered water passing over the nose and torpedo body is at a rate to alter the trajectory of any particulate matter that would tend to destabilize laminar boundary layer operation.