Edgardo T Anzures from 17 Cook St, Westboro, MA 01581, age 61, Phone: (508)8703113

Photoresist Processing Aid And Method
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US Patent:

6900003, May 31, 2005
Filed:

Apr 7, 2003
Appl. No.:

10/408414
Inventors:

Edgardo Anzures - Westborough MA, US
Daniel E. Lundy - Winchendon MA, US
Robert K. Barr - Shrewsbury MA, US
Corey O'Connor - Worcester MA, US
Assignee:

Shipley Company, L.L.C. - Marlborough MA
International Classification:

G03F007/32
US Classification:

430331, 510466
Abstract:

A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.

Functional Polymer
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US Patent:

7148265, Dec 12, 2006
Filed:

Mar 18, 2003
Appl. No.:

10/391154
Inventors:

Robert K. Barr - Shrewsbury MA, US
Edgardo Anzures - Westborough MA, US
Daniel E. Lundy - Winchendon MA, US
Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:

C08F 2/46
C08G 73/06
G03C 1/73
US Classification:

522 34, 522 35, 522 48, 522 50, 528423, 4302861
Abstract:

A polymer having α,β unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.

Dry Film Photoresist
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US Patent:

7323290, Jan 29, 2008
Filed:

Mar 18, 2003
Appl. No.:

10/391051
Inventors:

Robert K. Barr - Shrewsbury MA, US
Edgardo Anzures - Westborough MA, US
Daniel E. Lundy - Winchendon MA, US
Assignee:

Eternal Technology Corporation - Colonia Heights VA
International Classification:

G03F 7/038
G03F 7/028
G03F 7/033
US Classification:

4302851, 4302861, 4302871, 430916, 522 34, 522 35, 522905, 522904
Abstract:

A dry film photoresist includes a functional polymer. The functional polymer has α,β-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.

Functional Polymer
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US Patent:

7364834, Apr 29, 2008
Filed:

Jul 13, 2005
Appl. No.:

11/180951
Inventors:

Robert K. Barr - Shrewsbury MA, US
Edgardo Anzures - Westborough MA, US
Daniel E. Lundy - Winchendon MA, US
Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:

G03F 7/028
G03F 7/029
G03F 7/031
G03C 1/73
US Classification:

4302871, 4302861, 4302851, 430916, 430920, 430923, 522 34, 522 35, 522904, 522905, 522 48, 522 50
Abstract:

A polymer having α,β unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.

Methods Of Forming Printed Circuit Boards Having Optical Functionality
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US Patent:

7583880, Sep 1, 2009
Filed:

Dec 28, 2007
Appl. No.:

12/005990
Inventors:

Edgardo Anzures - Westborough MA, US
Philip D. Knudsen - Northboro MA, US
Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:

G02B 6/00
B05D 5/06
US Classification:

385129, 385130, 385147, 4271632
Abstract:

Provided are methods of forming printed circuit boards having optical functionality. The methods involve applying a dry-film to a printed circuit board substrate and forming an optical waveguide over the dry-film. The invention finds particular applicability in the electronics and optoelectronics industries.

Mask
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US Patent:

7632621, Dec 15, 2009
Filed:

Dec 23, 2004
Appl. No.:

11/020871
Inventors:

Edgardo Anzures - Westborough MA, US
Robert K. Barr - Shrewsbury MA, US
Thomas C. Sutter - Holden MA, US
Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:

G03F 7/00
G03F 7/004
US Classification:

4302701, 4302731, 4302811
Abstract:

A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions of the radiant energy sensitive material are removed using a suitable aqueous base developer. The mask is composed of aqueous base soluble or dispersible polymers and light-blocking agents.

Cleaning Composition And Method
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US Patent:

20030196685, Oct 23, 2003
Filed:

Dec 12, 2002
Appl. No.:

10/317967
Inventors:

Edgardo Anzures - Westborough MA, US
Robert Barr - Shrewsbury MA, US
Daniel Lundy - Winchendon MA, US
John Cahalen - Arlington MA, US
Assignee:

Shipley Company, L.L.C. - Marlborough MA
International Classification:

B08B009/00
C11D001/00
US Classification:

134/022190, 510/169000, 510/176000
Abstract:

A cleaning composition and method for removing built-up residue and scum on a substrate. The cleaning composition contains a compound of formula: where R is a hydrophobe, AO is a hydrophile, Z is a nonionic or anionic capping group, n is an integer of from 1 to 200 and m is an integer of from 1 to 3. The cleaning composition and method is effective for removing built-up residue and scum deposited by both positive-working photoresist and negative-working photoresist. Such residue and scum contain photoinitiators, dyes, and (meth)acrylic monomers.

Cleaning Composition
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US Patent:

20030199406, Oct 23, 2003
Filed:

Feb 5, 2003
Appl. No.:

10/358861
Inventors:

Edgardo Anzures - Westborough MA, US
Robert Barr - Shrewsbury MA, US
Daniel Lundy - Winchendon MA, US
Corey O'Connor - Worcester MA, US
Assignee:

Shipley Company, L.L.C. - Marlborough MA
International Classification:

C11D001/00
US Classification:

510/175000, 510/176000, 510/177000, 510/178000
Abstract:

A cleaning composition composed of a non-chelating organic acid, salt or ester thereof, and a chelating organic acid, salt or ester thereof that may be used to clean residue and scum from a substrate. The cleaning composition is suitable for cleaning residue and scum derived from photoresist.

Edgardo T Anzures