John T Lim

US Patent:

6384787, May 7, 2002

Filed:

Feb 21, 2001

Appl. No.:

09/789984

Inventors:

Yong Uk Kim - Bellflower CA
John Pong Lim - Anaheim CA
Andy G. Laquer - Tustin CA

Assignee:

The Boeing Company - Chicago IL

International Classification:

H01Q 138

US Classification:

343700MS, 343781 R

Abstract:

A space-fed, flat, reflectarray antenna apparatus for providing a desired degree of phase shift to a received electromagnetic wave to form a narrow beamwidth signal. The reflectarray antenna, in one form, is provided as a dual reflection antenna having a polarization sensitive subreflector and a reflectarray element spaced apart from the subreflector. The reflectarray element includes a large plurality of independent patch antenna units which each form antenna cells. Each patch antenna unit includes a vertical polarization sensitive antenna, a horizontal polarization sensitive antenna and a microstrip transmission line conjoining the two antennas. The microstrip transmission line of each antenna unit has a predetermined length intended to provide a predetermined degree of phase shift. Each patch antenna unit provides a polarization twist function to cause vertical polarization received by the vertical polarization sensitive antenna to be retransmitted by the horizontal polarization sensitive antenna as a horizontally polarized signal. Advantageously, the antenna is adapted for the insertion of MEMS phase shifters to provide for an electronically scanned antenna.

US Patent:

43561136, Oct 26, 1982

Filed:

Nov 17, 1980

Appl. No.:

6/207142

Inventors:

John Lim - Anaheim CA
Michael Brady - Studio City CA
Kirk Novak - Fullerton CA

Assignee:

Filtrol Corporation - Los Angeles CA

International Classification:

B01J 2906
B01J 3500

US Classification:

252455Z

Abstract:

This invention relates to a process for production of catalyst substrates and catalysts of calibrated pore size distribution by incorporation in and removal of particles of determined particle size from substrate or catalyst formulations.

US Patent:

42060850, Jun 3, 1980

Filed:

Jan 15, 1979

Appl. No.:

6/003407

Inventors:

John Lim - Anaheim CA
Dennis Stamires - Newport Beach CA
Michael Brady - Studio City CA

Assignee:

Filtrol Corporation - Los Angeles CA

International Classification:

B01J 2904
B01J 2908

US Classification:

252455Z

Abstract:

This invention relates to an improvement in the abrasion resistance of catalysts formulated from a mixture of an exchanged zeolite of the faujasite type, hydrated alumina and ammonium polysilicate or silica sol.

US Patent:

57069999, Jan 13, 1998

Filed:

Nov 28, 1995

Appl. No.:

8/563710

Inventors:

John K. Lim - Fullerton CA
Joseph S. Russo - Chatsworth CA

Assignee:

Hughes Electronics - Los Angeles CA

International Classification:

B23K 3102
B05D 302
B05D 512
C23C 2802

US Classification:

2281231

Abstract:

A composite material of silicon carbide particles in an aluminum matrix is base coated with a layer of a nickel-boron alloy by an electroless process. The base-coated composite material is heat treated at a temperature of about 450. degree. C. to interdiffuse the base coating with the composite material. A nickel or gold top layer is electrolytically deposited over the base coat on the heat-treated composite material.

US Patent:

46134913, Sep 23, 1986

Filed:

May 14, 1985

Appl. No.:

6/733883

Inventors:

Il N. Jung - Seoul, KR
Ko D. Cho - Seoul, KR
John C. Lim - Claremont CA
Bok-Ryul Yoo - Kyungki, KR

Assignee:

Korea Advanced Institute of Science and Technology - Seoul

International Classification:

C01B 3304

US Classification:

423347

Abstract:

There is disclosed a redistribution catalyst which is the reaction product of a quaternary ammonium halide salt or tertiary amine, and an inorganic carrier having surface hydroxyl groups, such as silica, zeolite, clays, and silicone resins. The catalyst is useful for the disproportionation of chlorosilicon hydrides to dichlorosilane and silane at reaction conditions including a temperature from 0. degree. to 200. degree. C. , in liquid or vapor phase with a pressure from 0. 1 to 10 atmospheres.

US Patent:

43258450, Apr 20, 1982

Filed:

Nov 9, 1979

Appl. No.:

6/092722

Inventors:

John Lim - Anaheim CA
Michael Brady - Studio City CA

Assignee:

Filtrol Corporation - Los Angeles CA

International Classification:

B01J 2908

US Classification:

252455Z

Abstract:

This invention relates to a method of producing a zeolite containing cracking catalyst by employing a sodium silicate derived silica gel in combination with clay to form a catalyst having a good attrition resistance, low carbon, and hydrogen forming properties.

US Patent:

47014300, Oct 20, 1987

Filed:

Aug 11, 1986

Appl. No.:

6/895139

Inventors:

Il N. Jung - Seoul, KR
Ko D. Cho - Seoul, KR
John C. Lim - Claremont CA
Bok-Ryul Yoo - Kyungki, KR

Assignee:

Korea Advance Institute of Science & Technology - Seoul

International Classification:

B01J 2906
B01J 3102

US Classification:

502 62

Abstract:

There is disclosed a redistribution catalyst which is the reaction product of a quaternary ammonium halide salt or tertiary amine, and an inorganic carrier having surface hydroxyl groups, such as silica, zeolite, clays, and silicone resins. The catalyst is useful for the redistribution of chlorosilicon hydrides to dichlorosilane and silane at reaction conditions of a temperature from 0. degree. to about 200. degree. C. , and a pressure from about 0. 1 to 10 atmospheres, in liquid or vapor phase.

US Patent:

42539897, Mar 3, 1981

Filed:

Apr 14, 1978

Appl. No.:

5/896318

Inventors:

John Lim - Anaheim CA
Ralph M. Haney - Woodland Hills CA

Assignee:

Filtrol Corporation - Los Angeles CA

International Classification:

B01J 2908

US Classification:

252455Z

Abstract:

The catalyst of this invention is composed of an exchanged zeolite of the faujasite type composited with a matrix composed of clay, alumina and silica added as sodium silicate, the added silica being in the range of about 0. 5% to less than about 3. 5% based on the composite catalyst on a volatile free basis.