Karen Huang

US Patent:

20060105494, May 18, 2006

Filed:

Jul 23, 1996

Appl. No.:

08/687117

Inventors:

KAREN HUANG - BOISE ID, US
CHRISTOPHE PIERRAT - BOISE ID, US

International Classification:

H01L 21/50
H01L 21/00

US Classification:

438106000, 438020000, 438907000, 438908000, 134902000

Abstract:

A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agents which can cause an oxide to form on the surface of one or more of the components. In one embodiment, a high vacuum transfer station couples a cleaning station and a sealing station to allow a component to be transferred from the cleaning station to the sealing station without leaving the high vacuum. In another embodiment, the apparatus includes a conveyor transferring the components from the cleaning station at a high vacuum to the sealing station at a similarly high vacuum without exposure to the atmosphere. Within the cleaning station, the component is cleaned using any of a variety of conventional cleaning techniques, including anisotropic and isotropic etching techniques such as reactive ion etching, plasma etching or vapor hydrofluoric acid etching. A third embodiment employs a single chamber for cleaning and sealing.

US Patent:

20060201539, Sep 14, 2006

Filed:

May 11, 2006

Appl. No.:

11/433129

Inventors:

Karen Huang - Boise ID, US
Christophe Pierrat - Boise ID, US

International Classification:

B08B 3/00
B08B 6/00

US Classification:

134084000, 134001300, 134902000

Abstract:

A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agents which can cause an oxide to form on the surface of one or more of the components. In one embodiment, a high vacuum transfer station couples a cleaning station and a sealing station to allow a component to be transferred from the cleaning station to the sealing station without leaving the high vacuum. In another embodiment, the apparatus includes a conveyor transferring the components from the cleaning station at a high vacuum to the sealing station at a similarly high vacuum without exposure to the atmosphere. Within the cleaning station, the component is cleaned using any of a variety of conventional cleaning techniques, including anisotropic and isotropic etching techniques such as reactive ion etching, plasma etching or vapor hydrofluoric acid etching. A third embodiment employs a single chamber for cleaning and sealing.

US Patent:

20060205100, Sep 14, 2006

Filed:

May 11, 2006

Appl. No.:

11/433170

Inventors:

Karen Huang - Boise ID, US
Christophe Pierrat - Boise ID, US

International Classification:

H01L 21/00

US Classification:

438020000, 438906000, 438106000

Abstract:

A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agents which can cause an oxide to form on the surface of one or more of the components. In one embodiment, a high vacuum transfer station couples a cleaning station and a sealing station to allow a component to be transferred from the cleaning station to the sealing station without leaving the high vacuum. In another embodiment, the apparatus includes a conveyor transferring the components from the cleaning station at a high vacuum to the sealing station at a similarly high vacuum without exposure to the atmosphere. Within the cleaning station, the component is cleaned using any of a variety of conventional cleaning techniques, including anisotropic and isotropic etching techniques such as reactive ion etching, plasma etching or vapor hydrofluoric acid etching. A third embodiment employs a single chamber for cleaning and sealing.

US Patent:

59866250, Nov 16, 1999

Filed:

Jan 7, 1997

Appl. No.:

8/779616

Inventors:

Karen Huang - Boise ID
Christophe Pierrat - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G09G 322

US Classification:

345 74

Abstract:

An application specific field emission display includes one or more extended emitters. The emitters are patterned according to a selected image where the selected image depends upon the application. In one embodiment, an emitter is patterned in a serpentine pattern to provide a single block of illumination. In another application, emitters are grouped in threes and the emitters are driven respectively by the red, green, and blue components of an image signal to produce a multicolor display. In a display assembly according to the invention, application specific emitters are incorporated in subdisplays on a common substrate with a conventional matrix addressable array. The array provides video, graphical or textual information and the subdisplays provide textual, fixed-shaped graphical, numerical or colorized information.