Kim M Do

US Patent:

8642246, Feb 4, 2014

Filed:

Aug 14, 2007

Appl. No.:

11/838854

Inventors:

Joseph Kennedy - San Jose CA, US
Songyuan Xie - Newark CA, US
Kim Do - Campbell CA, US
Sudip Mukhopadhyay - Berkeley CA, US

Assignee:

Honeywell International Inc. - Morristown NJ

International Classification:

G03F 7/075
G03F 7/11
C08L 83/06

US Classification:

4302721, 4302701, 528 31, 528 43

Abstract:

Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, at least one condensation catalyst, and at least one solvent. Tri-layer structures are also contemplated herein that comprise an organic underlayer (first layer), antireflective compositions and/or films contemplated herein (second layer) and a photoresist material (third layer) that are coupled to one another. Methods of producing a composition for tri-layer patterning applications includes: providing a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of phenyl groups coupled to the matrix of the polymer, providing at least one condensation catalyst, providing at least one solvent, providing at least one pH modifier, blending the formulated polymer and part of the at least one solvent in a reaction vessel to form a reactive mixture; and incorporating the at least one pH modifier, the at least one condensation catalyst and the remaining at least one solvent into the reactive mixture to form the composition.

US Patent:

20210075727, Mar 11, 2021

Filed:

Nov 19, 2020

Appl. No.:

16/952733

Inventors:

- Seattle WA, US
Sanjay Arunkumar Bhal - Germantown MD, US
James Michael Lamanna - Seattle WA, US
Kim Thanh Do - Fairfax Station VA, US
Justin Thomas Smith - Reston VA, US

Assignee:

Amazon Technologies, Inc. - Seattle WA

International Classification:

H04L 12/741
H04L 29/06
H04L 12/723
H04L 12/46
H04L 12/24
H04L 29/12

Abstract:

The following description is directed to configuring gateways in computer networks. For example, a method includes receiving a first request from a client associated with a configurable network. The first request can request associating a set of network addresses assigned to the configurable network to a gateway. A second request can be received from a client associated with the gateway. The second request can request accepting the association of the first request. It can be determined that the set of network addresses do not overlap with a network address space that is accessible using the gateway. Routing information can be generated for the gateway. The generated routing information can be used to configure the gateway for forwarding network packets between the client private network and the configurable network.