Sudhakar Balijepalli - Midland MI, US Dale J. Aldrich - Lake Jackson TX, US Laura A. Grier - Brazoria TX, US
Assignee:
Dow Global Technologies, Inc. - Midland MI
International Classification:
B24B001/00
US Classification:
451 41, 451 56, 451443, 51395
Abstract:
Provided are materials and methods for the chemical mechanical planarization of material layers such as oxide or metal formed on semiconductor substrates during the manufacture of semiconductor devices using a fixed abrasive planarization pad having an open cell foam structure from which free abrasive particles are produced by conditioning and combined with a carrier liquid to form an in situ slurry on the polishing surface of the planarization pad that, in combination with relative motion between the semiconductor substrate and the planarization pad, tends to remove the material layer from the surface of the semiconductor substrate. Depending on the composition of the material layer, the rate of material removal from the semiconductor substrate may be controlled by manipulating the pH or the oxidizer content of the carrier liquid.
Materials And Methods For Low Pressure Chemical-Mechanical Planarization
Sudhakar Balijepalli - Midland MI, US Dale J. Aldrich - Lake Jackson TX, US Laura A. Grier - Brazoria TX, US Michael E. Mills - Midland MI, US
Assignee:
Dow Global Technologies, Inc. - Midland MI
International Classification:
B24B001/00
US Classification:
451 41, 451 57
Abstract:
Provided are materials and methods for the chemical mechanical planarization of material layers using a down force of less than about 2. 5 psi while maintaining a material removal rate generally similar to that obtained using higher down forces while simultaneously improving the selectivity of the process with respect to a primary material formed over a barrier material. The materials and methods disclosed herein are suitable for use in meatallization operations during semiconductor device fabrication, in particular in processes in which the primary material is a softer metal such as copper and the barrier material is a harder material such as a metal nitride.
Sudhakar Balijepalli - Midland MI, US Dale J. Aldrich - Lake Jackson TX, US Laura A. Grier - Brazoria TX, US Bedri Erdem - Pearland TX, US Gregory F. Meyers - Midland MI, US
Assignee:
Dow Global Technologies, Inc. - Midland MI
International Classification:
B24D 11/00
US Classification:
451526, 451 41, 451529, 483691
Abstract:
Provided is a method for manufacturing a fixed abrasive material suitable for use in CMP planarization pads from an aqueous polymer dispersion that also includes abrasive particles that involves frothing the polymer dispersion, applying the froth to a substrate, mold or carrier and curing the froth to form a fixed abrasive material having an open cell structure containing between about 5 and 85 wt % abrasive particles and a dry density of about 350 kg/mto 1200 kg/m.
A prepolymer and products made from the preopolymer is described. The prepolymer includes the reaction product of at least one isocyanate and at least one natural oil based polyol. The natural oil based polyol includes at least two natural oil moieties separated by a molecular structure having an average of at least about 19 ether groups between any 2 of the natural oil moieties or by a polyether molecular structure having an equivalent weight of at least about 480.
Polyurethane-Based Sealant For Insulated Glass Units
Bindushree Radhakrishnan - Lake Jackson TX, US Dwight D. Latham - Clute TX, US Laura A. Grier - Brazoria TX, US William A. Koonce - Pearland TX, US Matthias Schaefer - Terneuzen, NL Paul D. Ries - Midland MI, US
International Classification:
C08G 18/32 C08G 18/34
US Classification:
528 85, 528 745
Abstract:
Insulated glass units are sealed with polyurethane made using a natural oil-based polyol (NOBP). In one embodiment the NOBP is made using a monol-rich monomer containing high levels of mono-hydroxy functional fatty acid methyl esters. Insulated glass sealants based on these compounds provide enhanced resistance to UV and oxidative degradation as compared to conventional products while still providing the required barrier and mechanical properties.
Bindushree Radhakrishnan - Lake Jackson TX, US Laura A. Grier - Brazoria TX, US Syed Z. Mahdi - Rochester Hills MI, US
Assignee:
DOW GLOBAL TECHNOLOGIES LLC - Midland MI
International Classification:
E04B 1/66 B32B 37/12
US Classification:
4284256, 156326, 4284231
Abstract:
Embodiments of the invention include insulated units and methods of producing the insulating units. The insulating units include a first surface, a structural seal disposed on at least portions of the first surface, and a second surface disposed on the structural seal. The structural seal includes the reaction product of at least one first isocyanate, at least one isocyanate reactive side, and at least one adhesion promoter including a reaction product of at least one secondary aminoalkoxy silane and at least one second isocyanate.
Process For Preparation Of Polyurethanes Utilizing Novel Catalysts
Laura A. Grier - Brazoria TX Paul L. Neill - Lake Jackson TX Ralph D. Priester - Lake Jackson TX Larry W. Mobley - Cohutta GA Kenneth W. Skaggs - Lake Jackson TX Robert B. Turner - Lake Jackson TX
Assignee:
The Dow Chemical Company - Midland MI
International Classification:
C08G 1824 C08J 904 B05D 726
US Classification:
521126
Abstract:
Novel catalyst compositions comprising complexes of tin(IV) salts and amine compounds are used to prepare polyurethanes, polyureas, polycarbodiimides and polyisocyanurates. The complexes, which preferably employ primary amines, allow delay of gelation until they dissociate under certain reaction conditions. The complexes can be prepared neat or in situ in an active hydrogen containing formulation component. The complexes serve to delay gelation of the formulation because they can be prepared to be relatively stable to moisture and will predictably dissociate upon heating, either as a result of the exothermic nature of the reaction being catalyzed or with application of an external heat source. The catalyst compositions are particularly useful for preparation of carpet underlay and in other applications requiring significant delay prior to gelation.
Polyurethane Sealant Based On Poly(Butylene Oxide) Polyols For Glass Sealing
A polyurethane glass sealant is made by reacting a poly(1,2-butylene oxide) polymer with a chain extender and a polyisocyanate. The poly(1,2-butylene oxide) polymer may be used as a mixture with up to 50% by weight of other polyols, including castor oil. The sealant is especially useful as a secondary sealant for an insulated glass unit (IGU).