Lin Zhou

US Patent:

6839202, Jan 4, 2005

Filed:

Apr 26, 2002

Appl. No.:

10/133596

Inventors:

Lin Zhou - Fishkill NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G11B 548

US Classification:

3602345, 174 36

Abstract:

An assembly includes a suspension, a magnetic head assembly, first and second write wires and first and second read wires wherein the magnetic head assembly includes a write head and a read head with the first and second write wires connected to the write head and the first and second read wires connected to the read head and wherein the first and second insulative sheaths are disposed about the first and second read wires and first and second conductive sheaths are disposed about the first and second insulative sheaths. In another aspect of the invention, third and fourth insulative sheaths are disposed about the first and second write wires and third and fourth conductive sheaths are disposed about the third and fourth insulative sheaths.

US Patent:

7325294, Feb 5, 2008

Filed:

Nov 17, 2004

Appl. No.:

10/991900

Inventors:

Lin Zhou - Fishkill NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G11B 5/187

US Classification:

2960303, 2960304, 29846, 29868, 205128, 205135, 20419234, 20419217, 174350

Abstract:

A method of making electromagnetic wave shielded read and write wires is provided. The method includes forming a bottom insulation layer on a bottom shield layer formed on a substrate. Then, forming electrically conductive wire material into openings in a first forming layer to form first and second read wires and first and second write wires. Forming a top insulation layer on the bottom insulation layer and on the wires. Then, forming a second forming layer on the top insulation layer with first, second, third, fourth and fifth openings down to the top insulation layer. Ion milling portions of the top insulation layer exposed by the openings in the second forming layer down to the bottom shield layer, then removing the second forming layer. Then, forming nonmagnetic electrically conductive middle shield layers in the openings in electrical contact with the bottom shield layer and forming a top shield layer on top of the middle shield layer.

US Patent:

7369947, May 6, 2008

Filed:

Jun 13, 2006

Appl. No.:

11/423844

Inventors:

Lin Zhou - LaGrangeville NY, US
Eric P. Solecky - Hyde Park NY, US

Assignee:

International Business Machines, Corporation - Armonk NY

International Classification:

G06F 17/00

US Classification:

702 27, 702170, 438 14, 438514, 734321

Abstract:

A test method for measuring adsorbed molecular contamination uses a test structure that includes a substrate comprising a plurality of separated test sites having a plurality separate thicknesses having a base design thickness and a designed thickness interrelationship. The test structure is exposed to a molecular contaminant environment to provide an adsorbed molecular contaminant layer upon each of the plurality of separated test sites. The plurality of separated test sites with the adsorbed molecular contaminant layer thereon is measured. An appropriate algorithm that considers the designed thickness interrelationship is used to determine at least one of: (1) the base design thickness; and (2) a thickness of the adsorbed molecular contaminant layer.

US Patent:

7397252, Jul 8, 2008

Filed:

Jul 31, 2006

Appl. No.:

11/461068

Inventors:

Lin Zhou - LaGrangeville NY, US
Eric P. Solecky - Hyde Park NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01R 27/00
F41G 1/38
G01N 23/00
G01J 5/00
G01B 11/28
G01B 11/06
G01B 11/02

US Classification:

324600, 33297, 250306, 250526, 356628, 356634, 356635

Abstract:

A method for accurately measuring feature sizes and quantifying the beam spot size in a CDSEM at real time is provided. The inventive method is based on a scanning microscope and it works on both conductive and non-conductive features. The measurement of conductive feature includes first providing a conductive feature on a surface of a substrate (the substrate maybe an insulator, a semiconductor or a material stack thereof). The conductive feature is then connected to ground and thereafter an electron beam probe raster scans the sample. When the electron beam probe hits the conductive feature the spot will have a negative potential. The potential difference between the spot and the ground will induce an electrical current flow. When the electrical beam is off the conductive feature, there will be no current flow. Therefore, by measuring the current response to the location of the beam spot, the dimension of the conductive feature can be derived.

US Patent:

7477365, Jan 13, 2009

Filed:

Jul 26, 2007

Appl. No.:

11/828666

Inventors:

Shahin Zangooie - Hopewell Junction NY, US
Roger M. Young - Warwick NY, US
Lin Zhou - LaGrangeville NY, US
Clemente Bottini - Marlboro NY, US
Ronald D. Fiege - Hopewell Junction NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01J 1/00
G01B 11/26
G01B 11/24
G01B 11/30
G01C 1/00

US Classification:

356121, 356138, 356601

Abstract:

A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot.

US Patent:

7479396, Jan 20, 2009

Filed:

Nov 30, 2005

Appl. No.:

11/290737

Inventors:

Lin Zhou - LaGrangeville NY, US
Eric P. Solecky - Hyde Park NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01L 21/00

US Classification:

438 14, 438 16, 257E2153

Abstract:

A structure, a system and a method are directed towards determination of a dimension of a patterned dimensionally unstable layer when the dimension is measured using an apparatus that induces a variation of the dimension. The structure, system and method use a patterned dimensionally unstable layer pattern design that correlates with an algorithm used to determine the dimension when the dimension is measured using the apparatus that induces the variation of the dimension.

US Patent:

7485859, Feb 3, 2009

Filed:

Apr 17, 2007

Appl. No.:

11/736191

Inventors:

Lin Zhou - LaGrangeville NY, US
Eric Peter Solecky - Hyde Park NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01R 27/00
F41G 1/30

US Classification:

250306, 250526, 356634, 356635

Abstract:

A charged beam apparatus, such as an electron microscopy apparatus, and a method for determining an aerial dimensional map of a charged beam within the charged beam apparatus, each use a test structure that includes a feature located upon a substrate. One of the feature and the substrate is conductive and the other of the feature and the structure is non conductive. The charged beam within the charged beam apparatus is scanned in a plurality of non-parallel linear directions with respect to the substrate and the feature to provide a corresponding plurality of current versus position response curves from which may be determined the aerial dimensional map of the charged beam within the charged beam apparatus.

US Patent:

7532867, May 12, 2009

Filed:

Mar 15, 2006

Appl. No.:

11/377695

Inventors:

Shih Mo - Milpitas CA, US
Junjie Yang - Santa Clara CA, US
Lin Zhou - Milpitas CA, US
Chung-Hsing Chang - Milpitas CA, US
Ted Hsiung - Saratoga CA, US

International Classification:

H04B 1/44
H04Q 7/20

US Classification:

455 78, 4551274, 4555521

Abstract:

Transceiver architectures for supporting multi-band radio frequencies are disclosed. According to one aspect of the present invention, a number of processing channels are designed, each for one specified carrier frequency. A number of switching means is provided to ensure that a processing channel is properly selected for a specified carrier frequency. Each of the processing channels includes at least an amplified and a low-pass filter, where the low-pass filter is automatically programmable in response to a wireless standard (e. g. , Wi-Fi or WiMAX). A single voltage oscillator (VCO) is used to support operations of each of the processing channels.