Lin Zhou

US Patent:

7532867, May 12, 2009

Filed:

Mar 15, 2006

Appl. No.:

11/377695

Inventors:

Shih Mo - Milpitas CA, US
Junjie Yang - Santa Clara CA, US
Lin Zhou - Milpitas CA, US
Chung-Hsing Chang - Milpitas CA, US
Ted Hsiung - Saratoga CA, US

International Classification:

H04B 1/44
H04Q 7/20

US Classification:

455 78, 4551274, 4555521

Abstract:

Transceiver architectures for supporting multi-band radio frequencies are disclosed. According to one aspect of the present invention, a number of processing channels are designed, each for one specified carrier frequency. A number of switching means is provided to ensure that a processing channel is properly selected for a specified carrier frequency. Each of the processing channels includes at least an amplified and a low-pass filter, where the low-pass filter is automatically programmable in response to a wireless standard (e. g. , Wi-Fi or WiMAX). A single voltage oscillator (VCO) is used to support operations of each of the processing channels.

US Patent:

60105380, Jan 4, 2000

Filed:

Jan 11, 1996

Appl. No.:

8/585164

Inventors:

Mei H. Sun - Los Altos CA
Herbert E. Litvak - Cupertino CA
Huey M. Tzeng - San Jose CA
Daniel E. Glenn - Mountain View CA
Earl M. Jensen - Sunnyvale CA
Frank J. Hausman - San Francisco CA
Lin Jun Zhou - Palo Alto CA

Assignee:

Luxtron Corporation - Santa Clara CA

International Classification:

H05K 304
B24B 704

US Classification:

756345

Abstract:

In an apparatus for removing material from an article, such as an exposed surface of an intermediate integrated circuit structure, by planarizing, polishing, etching or the like, a sensor is mechanically coupled to a moving carrier of the article for directing through the article to its first side an electromagnetic radiation beam having a wavelength band to which the structure is substantially transparent. The beam is detected after interacting with the article, such as being reflected from its exposed surface, and resulting information of the state of the processing of the exposed surface is transmitted from the moving carrier to a stationary receiver by radiation without the use of any physical transmission media such as wires or optical fibers. Multiple sensors mounted on the moving article carrier provide information of the uniformity of the processing across the exposed article surface. The radiation signal received by the stationary receiver is used to monitor or control the processing, such as by determining an endpoint thereof.

US Patent:

62961586, Oct 2, 2001

Filed:

Dec 3, 1999

Appl. No.:

9/452856

Inventors:

Lin Zhou - Miami FL
Cheng Shan Yin - Miami FL

International Classification:

B65D 572

US Classification:

222570

Abstract:

A flexible disposable spout removably mounted to the inwardly extending flanges found in certain types of cans, particularly paint cans, to ensure that its contents are properly poured out and no contact is made with the can itself. The spout has a cylindrical or frustoconical shape with two ends. At least one of the ends has two parallel and peripherally extending ridge members that are kept at a predetermined spaced apart relationship with respect to each other to cooperatively engage with the inwardly extending flange defining the can opening. The other end may be designed to also accept the same type of inward flange for an opening of a different size typically associated with a can of a different capacity or the same capacity with different opening dimensions. Thus the spout's cylindrical portion has a frustoconical shape. The peripheral ridge member farthest from the end is larger in longitudinal height than the one adjacent to the end so that it acts as a stopper against the inwardly extending flange when spout is pushed through the can's opening.

US Patent:

20190348279, Nov 14, 2019

Filed:

May 9, 2018

Appl. No.:

15/975408

Inventors:

- Santa Clara CA, US
Lin ZHOU - Santa Clara CA, US

International Classification:

H01L 21/027
H01L 21/311
H01L 21/3213
C23C 16/455
H01L 21/683

Abstract:

Methods for patterning a film stack are provided. In one embodiment, a method for patterning a film stack disposed on a substrate includes performing a first etching process to etch a film stack disposed on a substrate, wherein the film stack includes a patterned photoresist layer disposed on an upper layer on a lower layer disposed on the substrate, wherein the patterned photoresist layer comprises openings defined between features and the features have a first pitch, wherein the first etching process removes between about 40 percent and about 95 percent of the lower layer exposed by the patterned photoresist layer from the film stack, performing a second etching process on the film stack, and upon completion of the second etching process, transferring the features into the upper or lower layer in the film stack having a second pitch, wherein the second pitch is shorter than the first pitch.