Ming Sen Jiang

US Patent:

D484518, Dec 30, 2003

Filed:

Feb 11, 2002

Appl. No.:

29/178376

Inventors:

Ming Jiang - San Francisco CA 94108

Assignee:

Ming Jiang - San Francisco CA

International Classification:

1507

US Classification:

D15 89

US Patent:

8191237, Jun 5, 2012

Filed:

May 21, 2009

Appl. No.:

12/470385

Inventors:

Guanghong Luo - Fremont CA, US
Ge Yi - Pleasanton CA, US
Dujiang Wan - Fremont CA, US
Lei Wang - Fremont CA, US
Xiaohai Xiang - Danville CA, US
Ming Jiang - San Jose CA, US

Assignee:

Western Digital (Fremont), LLC - Fremont CA

International Classification:

G11B 5/127
H04R 31/00

US Classification:

2960316, 2960313, 2960314, 2960315, 2960318, 360121, 360122, 360317, 451 5, 451 41

Abstract:

A method for providing a structure in a magnetic transducer is described. The method includes performing a first planarization that exposes a top surface of the magnetic transducer. This first planarization also terminates before a portion of a first planarization buffer layer is removed. The method also includes providing a second planarization buffer layer after the first planarization is performed. The second planarization buffer layer is above the first planarization buffer layer. The method also includes performing a second planarization. This second planarization does not completely remove the second planarization buffer layer. The method also includes performing a third planarization terminating after the first planarization buffer layer is exposed and before the first planarization buffer layer is completely removed.

US Patent:

8262918, Sep 11, 2012

Filed:

Mar 25, 2009

Appl. No.:

12/411270

Inventors:

Yun-Fei Li - Fremont CA, US
Ronghui Zhou - Fremont CA, US
Guanghong Luo - Fremont CA, US
Ming Jiang - San Jose CA, US

Assignee:

Western Digital (Fremont), LLC - Fremont CA

International Classification:

B44C 1/22

US Classification:

216 22, 216 66, 216 88, 216 89, 2504923

Abstract:

Methods of producing magnetic recording heads are disclosed. The methods can include providing a wafer comprising a substrate layer in which are disposed a plurality of damascene trenches. The method can further include depositing a pole material across the whole wafer, wherein the plurality of trenches are filled with the pole material. The methods can further include depositing a mask material over the pole material across the whole wafer. The methods can further include performing a first material removal process across the whole wafer to remove the mask material and a first portion of the pole material at a same material removal rate. The methods can further include performing a second material removal process to remove a second portion of the pole material above the substrate layer.

US Patent:

8262919, Sep 11, 2012

Filed:

Jun 25, 2010

Appl. No.:

12/824036

Inventors:

Guanghong Luo - Fremont CA, US
Changqing Shi - San Ramon CA, US
Danning Yang - Fremont CA, US
Jinwen Wang - Fremont CA, US
Ming Jiang - San Jose CA, US

Assignee:

Western Digital (Fremont), LLC - Fremont CA

International Classification:

B44C 1/22

US Classification:

216 22, 438 3

Abstract:

A method and system for providing a pole of magnetic transducer having an intermediate layer are described. The method and system include providing a trench in the intermediate layer and depositing a nonmagnetic liner. A portion of the nonmagnetic liner resides in the trench. At least one seed layer is deposited. A portion of the at least one seed layer resides in the trench. The method and system include depositing at least one main pole layer. The at least one main pole layer is magnetic. A portion of the main pole layer(s) reside in the trench. The method and system also include performing a first chemical mechanical planarization (CMP). An excess portion of the seed layer(s) external to the trench are removed through an ion beam etch. The method and system further include performing a second CMP to remove an excess portion of the nonmagnetic liner external to the trench.

US Patent:

8375564, Feb 19, 2013

Filed:

Dec 8, 2009

Appl. No.:

12/633562

Inventors:

Guanghong Luo - Fremont CA, US
Danning Yang - Fremont CA, US
Weimin Si - Pleasanton CA, US
Dujiang Wan - Fremont CA, US
Yun-Fei Li - Fremont CA, US
Lijie Guan - San Jose CA, US
Ming Jiang - San Jose CA, US

Assignee:

Western Digital (Fremont), LLC - Fremont CA

International Classification:

G11B 5/127
H04R 31/00

US Classification:

2960316, 2960313, 2960314, 2960315, 2960318, 216 62, 216 66, 216 67, 360121, 360122, 360317, 451 5, 451 41

Abstract:

A method provides a pole of magnetic recording transducer. A nonmagnetic stop layer having a thickness and a top surface is provided. A depression that forms a bevel is provided in the stop layer. The bevel has a depth less than the thickness and a bevel angle with respect to a remaining portion of the top surface. The bevel angle is greater than zero and less than ninety degrees. An intermediate layer having a substantially flat top surface is provided over the stop layer. A trench is formed in the intermediate layer via a removal process. The trench has a profile corresponding to the pole. The stop layer is a stop for the removal process. The method also includes providing the pole in the trench. The pole has a leading edge bevel corresponding to the bevel in the stop layer.

US Patent:

8404129, Mar 26, 2013

Filed:

Mar 31, 2010

Appl. No.:

12/751815

Inventors:

Guanghong Luo - Fremont CA, US
Danning Yang - Fremont CA, US
Ming Jiang - San Jose CA, US

Assignee:

Western Digital (Fremont), LLC - Fremont CA

International Classification:

B44C 1/22

US Classification:

216 22, 216 24, 216 26, 216 88, 216 89, 438689, 438690, 438691, 438692

Abstract:

A method and system for fabricating an optical component are described. The method and system include providing a first planarization stopping and a second planarization stopping structure. The first planarization stopping structure has a first height and a first edge. The second planarization stopping structure has a second height different from the first height and a second edge. The first edge is separated from the second edge by a distance. The method and system also include providing an optical material. The optical material resides at least between the first edge of the first planarization stopping structure and the second edge of the second planarization stopping structure. The method and system also include planarizing the optical components. The planarization removes a portion of the optical material to form a surface between the first planarization stopping structure and the second planarization stopping structure. This surface has a curvature.

US Patent:

8480911, Jul 9, 2013

Filed:

Jun 30, 2011

Appl. No.:

13/173846

Inventors:

Masahiro Osugi - Fremont CA, US
Guanghong Luo - Fremont CA, US
Lily Yao - Hayward CA, US
Ming Jiang - San Jose CA, US

Assignee:

Western Digital (Fremont), LLC - Fremont CA

International Classification:

B44C 1/22

US Classification:

216 22, 216 62, 216 75, 360313, 438720

Abstract:

A read sensor for a read transducer is fabricated. The read transducer has field and device regions. A read sensor stack is deposited. A mask covering part of the stack corresponding to the read sensor is provided. The read sensor having inboard and outboard junction angles is defined from the stack in a track width direction. A critical junction (CJ) focused ion beam scan (FIBS) polishing that removes part of the read sensor based on the junction angles is performed. A hard bias structure is deposited and the transducer planarized. A remaining portion of the mask is removed. A stripe height mask covering part of the read sensor and hard bias structure in a stripe height direction is provided. The read sensor stripe height is defined. A tunneling magnetoresistance (TMR) FIBS polishing that removes part of the stack in the field region is performed.

US Patent:

8486285, Jul 16, 2013

Filed:

Aug 20, 2009

Appl. No.:

12/544998

Inventors:

Ronghui Zhou - Fremont CA, US
Ming Jiang - San Jose CA, US
Xiaohai Xiang - Danville CA, US
Jinwen Wang - Fremont CA, US
Guanghong Luo - Fremont CA, US
Yun-Fei Li - Fremont CA, US

Assignee:

Western Digital (Fremont), LLC - Fremont CA

International Classification:

B44C 1/22

US Classification:

216 22, 438424, 438692, 2960316

Abstract:

A method for forming a write pole comprises forming a stop layer over a substrate layer of a wafer, the stop layer having an opening above a damascene trench in the substrate layer, and forming a buffer layer over the stop layer, the buffer layer having an opening above the opening of the stop layer. The method further comprises plating a layer of magnetic material over the wafer, disposing a first sacrificial material over a region of the magnetic material above the damascene trench, performing a milling or etching operation over the wafer to remove the magnetic material not covered by the first sacrificial material and to remove the first sacrificial material, disposing a second sacrificial material over the wafer, and performing a polishing operation over the wafer to remove the region of the magnetic material above the damascene trench, the second sacrificial material, and the buffer layer.