Padma Gopalan

US Patent:

8268180, Sep 18, 2012

Filed:

Jan 25, 2011

Appl. No.:

13/013531

Inventors:

Michael S. Arnold - Middleton WI, US
Padma Gopalan - Madison WI, US
Nathaniel S. Safron - Madison WI, US

Assignee:

Wisconsin Alumni Research Foundation - Madison WI

International Classification:

B31D 3/00

US Classification:

216 56, 216 41, 216 49, 216 81, 438142, 438198, 438197, 438655, 438683

Abstract:

Methods for forming a nanoperforated graphene material are provided. The methods comprise forming an etch mask defining a periodic array of holes over a graphene material and patterning the periodic array of holes into the graphene material. The etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer. The nanoperforated graphene material can consist of a single sheet of graphene or a plurality of graphene sheets.

US Patent:

8362179, Jan 29, 2013

Filed:

Nov 19, 2008

Appl. No.:

12/273987

Inventors:

Padma Gopalan - Madison WI, US

Assignee:

Wisconsin Alumni Research Foundation - Madison WI

International Classification:

C08F 220/14
C08F 212/08

US Classification:

5263292, 526346, 5263297, 525912, 525913

Abstract:

The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.

US Patent:

20090111703, Apr 30, 2009

Filed:

Oct 26, 2007

Appl. No.:

11/924803

Inventors:

Padma Gopalan - Madison WI, US

International Classification:

C40B 30/04
C40B 50/00
C40B 40/14

US Classification:

506 9, 506 20, 506 23

Abstract:

The present invention provides crosslinked epoxy-functional copolymer films and microarrays built from the crosslinked epoxy-functional copolymer films. Microarrays incorporating the copolymers include a substrate on which a film of the crosslinked epoxy-functional copolymer is disposed and target molecules bound to the copolymer film. The crosslinked polymer films are well-suited for use as scaffolds for target molecules in microarrays because they provide a high density of binding sites for the target molecules, are mechanically stable, and may be coated onto a wide range of substrates.

US Patent:

20120116007, May 10, 2012

Filed:

Oct 10, 2011

Appl. No.:

13/270044

Inventors:

Padma Gopalan - Madison WI, US

Assignee:

WISCONSIN ALUMNI RESEARCH FOUNDATION - Madison WI

International Classification:

C09D 153/00
C08F 293/00

US Classification:

524529, 525242, 525299, 525280

Abstract:

Provided are novel polymer brushes that may be used in underlying buffer or imaging layers for block copolymer lithography. The novel polymer brushes include X-A-b-B and X-A-b-C block copolymer brushes, with X an anchoring group, the A block a lithographically sensitive polymer, and the C block a random copolymer. According to various embodiments; polymer block brushes for neutral and preferential layers are provided; the neutral layers non-preferential to the overlying block copolymer and the preferential layers preferential to a block of the overlying block copolymer. Also provided are novel methods of patterning polymer block brush layers as well as polymer block brush buffer and imaging layers that are directly patternable by e-beam, deep UV, extreme UV, X-ray or other lithographic methods.

US Patent:

20120325405, Dec 27, 2012

Filed:

Aug 23, 2012

Appl. No.:

13/592466

Inventors:

Michael S. Arnold - Middleton WI, US
Padma Gopalan - Madison WI, US
Nathaniel S. Safron - Madison WI, US

International Classification:

C23F 1/02

US Classification:

1563453

Abstract:

Methods for forming a nanoperforated graphene material are provided. The methods comprise forming an etch mask defining a periodic array of holes over a graphene material and patterning the periodic array of holes into the graphene material. The etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer. The nanoperforated graphene material can consist of a single sheet of graphene or a plurality of graphene sheets.

US Patent:

20130108839, May 2, 2013

Filed:

Oct 27, 2011

Appl. No.:

13/282666

Inventors:

Michael S. Arnold - Middleton WI, US
Padma Gopalan - Madison WI, US
Nathaniel S. Safron - Madison WI, US

International Classification:

B32B 3/00
B05D 3/00
C01B 31/04
B05D 5/00
B82B 1/00
B82B 3/00

US Classification:

4281951, 423448, 427256, 977842, 977734

Abstract:

Methods of producing layers of patterned graphene with smooth edges are provided. The methods comprise the steps of fabricating a layer of crystalline graphene on a surface, wherein the layer of crystalline graphene has a crystallographically disordered edge, and decreasing the crystallographic disorder of the edge of the layer of crystalline graphene by heating the layer of crystalline graphene on the surface at an elevated temperature in a catalytic environment comprising carbon-containing molecules.

US Patent:

20130160701, Jun 27, 2013

Filed:

Aug 23, 2012

Appl. No.:

13/592564

Inventors:

Michael S. Arnold - Middleton WI, US
Padma Gopalan - Madison WI, US
Nathaniel S. Safron - Madison WI, US

International Classification:

C30B 25/04
C01B 31/04

US Classification:

117 95, 977843

Abstract:

Methods for growing microstructured and nanostructured graphene by growing the microstructured and nanostructured graphene from the bottom-up directly in the desired pattern are provided. The graphene structures can be grown via chemical vapor deposition (CVD) on substrates that are partially covered by a patterned graphene growth barrier which guides the growth of the graphene.

US Patent:

20220306475, Sep 29, 2022

Filed:

Mar 23, 2021

Appl. No.:

17/209944

Inventors:

- Madison WI, US
Robert Michael Jacobberger - Evanston IL, US
Padma Gopalan - Madison WI, US
Jonathan H. Dwyer - Madison WI, US

International Classification:

C01B 32/194
C09D 133/12

Abstract:

Methods of transferring nanostructures from a first substrate to another substrate using a copolymer polymerized from one or more non-crosslinking monomers and one or more comonomers bearing crosslinkable groups as a transfer medium are provided. Relative to a poly(methyl methacrylate) homopolymer, the crosslinkable copolymers bond more strongly to the first substrate and, as a result, are able to transfer even very narrow nanostructures between substrates with high transfer yields.