Jeff Gasparitsch - Fremont CA Robert Taff - Brentwood CA Kenneth J. Bahng - Cupertino CA Paul Stasiewicz - Fremont CA Erik H. Engdahl - Livermore CA
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
B24B 2108
US Classification:
451303, 451307
Abstract:
A platen for use in chemical mechanical planarization (CMP) systems is disclosed. The platen is arranged below a linear polishing pad and designed to apply a controlled fluid flow to the underside of the linear polishing pad. The platen includes a leading zone containing a first plurality of output holes. The leading zone is oriented more proximate to an upstream region of the linear polishing pad. The platen also includes a trailing zone containing a second plurality of output holes. The trailing zone is oriented more proximate to a downstream region of the linear polishing pad. The leading zone and the trailing zone are independently controlled and designed to output the controlled fluid flow independently from each of the first plurality of output holes and the second plurality of output holes.
Color Filter Substrate For Liquid Crystal Display Device And Method For Fabricating The Same
Bong Chul Kim - Daegu, KR Seung Hyung Lee - Gyeonggi-do, KR Kyo Yong Koo - Gyeongsangbuk-do, KR Hyeon Jin Seo - Gyeongsangbuk-do, KR Dhang Kwon - Daejeon, KR Robert Taff - Pleasanton CA, US
Assignee:
LG Display Co., Ltd. - Seoul
International Classification:
G02F 1/1339 G02F 1/1333 G02F 1/1335
US Classification:
349155, 349158, 349106
Abstract:
A color filter substrate includes a black matrix on a transparent insulating substrate, the blacking matrix defining a pixel area, color filters in the pixel area, an overcoating layer over the black matrix and the color filters, the overcoating layer having a plurality of grooves, a plurality of column spacers on the overcoating layer, and a plurality of ball spacers in the grooves of the overcoating layer.
David Albertalli - Santa Clara CA, US Robert Taff - Brentwood CA, US Oleg N. Gratchev - San Jose CA, US
Assignee:
Ulvac, Inc. - Kanagawa
International Classification:
B41J 2/165
US Classification:
347 29, 347 28, 347 36
Abstract:
The present teachings relate to a printhead maintenance station for an industrial printing apparatus which is used to prevent clogging of the printhead, particularly during periods in which the printheads are idle. The maintenance station includes a capping station which has sockets for keeping the printheads moist and a blotting station for cleaning any residual printing fluids prior to carrying out a print function.
Paul A. Parks - Austin TX, US Robert F. Taff - Brentwood CA, US Roy M. Patterson - Round Rock TX, US David Albertalli - Santa Clara CA, US Cheuk Lee - Castro Valley CA, US Ben J. Sy - Austin TX, US
Assignee:
Ulvac, Inc. - Chigasaki, Kanagawa
International Classification:
B41J 23/00
US Classification:
347 37, 347 40
Abstract:
According to the present disclosure, a printer apparatus may include a chuck configured to support a substrate thereon, a rail spaced apart from the chuck, a printhead carriage frame coupled to the rail, and a printhead carriage pivotally coupled to the printhead carriage frame.
Bong Chul Kim - Daegu, KR Jun Beom Cho - Gyeonggi-do, KR Seung Hyung Lee - Gyeonggi-do, KR Kyo Yong Koo - Gyeongsangbuk-do, KR Hyeon Jin Seo - Gyeongsangbuk-do, KR Dhang Kwon - Daejeon, KR Robert Taff - Pleasanton CA, US
Assignee:
LG Display Co., Ltd. - Seoul ULVAC, Inc. - Kanagawa-ken
An apparatus for coating a polyimide layer includes a printing table in which a substrate is provided, an inkjet head having an injection surface with nozzles for injecting a polyimide liquid onto the substrate, a polyimide liquid supply tank filled with the polyimide liquid, an ultrasonic cleaner in which a cleaning liquid for cleaning the inkjet head is stored for cleaning the inkjet head with vibrations in the cleaning liquid generated by applying an ultrasonic signal, and a wiper for wiping an injection surface of the inkjet head.
Takumi Namekawa - Chigasaki, JP Kei Baba - Chigasaki, JP Yuya Inoue - Chigasaki, JP Masao Murata - Chigasaki, JP Koji Hane - Chigasaki, JP Robert D. Taff - Pleasanton CA, US Robert R. McKay - Pleasanton CA, US Ralph D. Fox - Pleasanton CA, US
The present invention provides applicators reducing generating bubble. Dispersion liquid is supplied while the pressure of a circulation tank on the delivery side is lower than the atmospheric pressure but higher than the pressure of the space in buffer tanks. The dispersion liquid in the discharge chambers is recovered while the pressure in a circulation tank serving as recovery destination is lower than the atmospheric pressure. Gas dissolution can be reduced because the dispersion liquid does not come into contact with gases at pressures higher than the atmospheric pressure and engulffing gas or deformation of solid microparticles can be avoided because no pump is used.
Principal Engineer at Zoom Systems, Principal Mechanical Engineer at ZoomSystems
Location:
San Francisco Bay Area
Industry:
Design
Work:
Zoom Systems since 2009
Principal Engineer
ZoomSystems since 2009
Principal Mechanical Engineer
Litrex Corporation Nov 2002 - Apr 2008
Engineering Manager
Lam research 1997 - 2002
Engineering Manager
Coleman Company Inc Jan 1993 - Oct 1997
Design Engineer