Robin Lea Walton

US Patent:

20180196173, Jul 12, 2018

Filed:

Mar 9, 2018

Appl. No.:

15/916603

Inventors:

- Corning NY, US
Frederick J Gagliardi - Jeffrey NH, US
Gary Allen Hart - Walworth NY, US
Timothy R Soucy - Brattleboro VT, US
Robin Merchant Walton - Redwood City CA, US
Leonard Gerard Wamboldt - Sunderland MA, US
Jue Wang - Fairport NY, US

International Classification:

G02B 5/08
G02B 1/14

Abstract:

The disclosure is directed to a highly reflective multiband mirror that is reflective in the VIS-NIR-SWIR-MWIR-LWIR bands, the mirror being a complete thin film stack that consists of a plurality of layers on a selected substrate. In order from substrate to the final layer, the mirror consists of (a) substrate, (b) barrier layer, (c) first interface layer, (d) a reflective layer, (e) a second interface layer, (f) tuning layer(s) and (g) a protective layer. In some embodiments the tuning layer and the protective layer are combined into a single layer using a single coating material. The multiband mirror is more durable than existing mirrors on light weight metal substrates, for example 6061-Al, designed for similar applications. In each of the five layer types methods and materials are used to process each layer so as to achieve the desired layer characteristics, which aid to enhancing the durability performance of the stack.

US Patent:

20180180777, Jun 28, 2018

Filed:

Feb 22, 2018

Appl. No.:

15/902114

Inventors:

- Corning NY, US
Gary Allen Hart - Walworth NY, US
Robin Merchant Walton - Redwood City CA, US
Leonard Gerard Wamboldt - Sunderland MA, US
Jue Wang - Fairport NY, US

International Classification:

G02B 5/08
C23C 14/58
C23C 14/35
G02B 1/14
C23C 14/02
C23C 14/16

Abstract:

A method for coating substrates is provided. The method includes diamond turning a substrate to a surface roughness of between about 60 Å and about 100 Å RMS, wherein the substrate is one of a metal and a metal alloy. The method further includes polishing the diamond turned surface of the substrate to a surface roughness of between about 10 Å and about 25 Å to form a polished substrate, heating the polished substrate, and ion bombarding the substrate with an inert gas. The method includes depositing a coating including at least one metallic layer on the ion bombarded surface of the substrate using low pressure magnetron sputtering, and polishing the coating to form a finished surface having a surface roughness of less than about 25 Å RMS using a glycol based colloidal solution.

US Patent:

20150293275, Oct 15, 2015

Filed:

Apr 6, 2015

Appl. No.:

14/679339

Inventors:

- Corning NY, US
Gary Allen Hart - Walworth NY, US
Robin Merchant Walton - Redwood City CA, US
Leonard Gerard Wamboldt - Sunderland MA, US
Jue Wang - Fairport NY, US

International Classification:

G02B 5/08
G02B 1/14
C23C 14/58
C23C 14/35
C23C 14/02

Abstract:

A method for coating substrates is provided. The method includes diamond turning a substrate to a surface roughness of between about 60 Å and about 100 Å RMS, wherein the substrate is one of a metal and a metal alloy. The method further includes polishing the diamond turned surface of the substrate to a surface roughness of between about 10 Å and about 25 Å to form a polished substrate, heating the polished substrate, and ion bombarding the substrate with an inert gas. The method includes depositing a coating including at least one metallic layer on the ion bombarded surface of the substrate using low pressure magnetron sputtering, and polishing the coating to form a finished surface having a surface roughness of less than about 25 Å RMS using a glycol based colloidal solution.