Sofia I Pombrik

US Patent:

8299286, Oct 30, 2012

Filed:

Dec 4, 2007

Appl. No.:

11/949871

Inventors:

Robin A. Gardiner - Strasslach, DE
Thomas H. Baum - New Fairfield CT, US
Douglas Cameron Gordon - Durango CO, US
Timothy E. Glassman - Portland OR, US
Sofia Pombrik - Bethel CT, US
Brian A. Vaartstra - Nampa ID, US
Peter S. Kirlin - Austin TX, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C07F 7/00
C23C 18/00

US Classification:

556 40, 106 125

Abstract:

A β-diketonate alkoxide metal compound and a source reagent composition are provided. The β-diketonate alkoxide metal compound may include a metal M selected from Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Fe, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Cu, Dy, Ho, Al, Tl, Er, Sn, Pb, Tm, Bi, Lu, Th, Pd, Pt, Ga, In, Au, Ag, Li, Na, K, Rb, Cs, Mo, and Yb. The metal may be complexed to at least one alkoxide ligand and one β-diketonate ligand.

US Patent:

58206647, Oct 13, 1998

Filed:

Mar 31, 1995

Appl. No.:

8/414504

Inventors:

Robin A. Gardiner - Bethel CT
Peter S. Kirlin - Bethel CT
Thomas H. Baum - New Fairfield CT
Douglas Gordon - Salt Lake City UT
Timothy E. Glassman - Danbury CT
Sofia Pombrik - Bethel CT
Brian A. Vaartstra - Brookfield CT

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C09K 300
C23C 1640

US Classification:

10628717

Abstract:

A metal source reagent liquid solution, comprising: (i) at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex, wherein the ligand is selected from the group consisting of:. beta. -diketonates,. beta. -ketoiminates,. beta. -diiminates, C. sub. 1 -C. sub. 8 alkyl, C. sub. 2 -C. sub. 10 alkenyl, C. sub. 2 -C. sub. 15 cycloalkenyl, C. sub. 6 -C. sub. 10 aryl, C. sub. 1 -C. sub. 8 alkoxy, and fluorinated derivatives thereof; and (ii) a solvent for the metal coordination complex. The solutions are usefully employed for chemical vapor deposition of metals from the metal coordination complexes, such as Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Fe, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Cu, Dy, Ho, Al, Tl, Er, Sn, Pb, Tm, Bi, and/or Yb. The solvent may comprise glyme solvents, alkanols, organic ethers, aliphatic hydrocarbons, and/or aromatic hydrocarbons. Solutions of the invention having two or more metal coordination complexes are resistant to detrimental ligand exchange reactions which adversely affect the stability and/or volatilizability of the metal complex for CVD applications.

US Patent:

61627127, Dec 19, 2000

Filed:

Jan 16, 1998

Appl. No.:

9/008705

Inventors:

Thomas H. Baum - New Fairfield CT
Peter S. Kirlin - Bethel CT
Sofia Pombrik - Bethel CT

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

H01L 2144

US Classification:

438580

Abstract:

A platinum source reagent liquid solution, comprising: (i) at least one platinum source compound selected from the group consisting of compounds of the formulae: (A) RCpPt(IV)R'. sub. 3 compounds, of the formula: ##STR1## wherein: R is selected from the group consisting of hydrogen, methyl, ethyl, i-propyl, n-propyl, n-butyl, i-butyl, t-butyl, trimethylsilyl and trimethylsilyl methyl; and each R' is independently selected from the group consisting of methyl, ethyl, i-propyl, n-propyl, n-butyl, i-butyl, t-butyl, trimethylsilyl and trimethylsilyl methyl; and (B) Pt(. beta. -diketonates). sub. 2 of the formula: ##STR2## wherein: each R" is independently selected from the group consisting of methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, trifluoromethyl, perfluoroethyl, and perfluoro-n-propyl, and (ii) a solvent medium therefor. The platinum source reagent liquid solutions of the invention are readily employed in a chemical vapor deposition process system including a liquid delivery apparatus for volatilizing the source reagent liquid solution and transporting the resulting vapor to the chemical vapor deposition reactor for deposition of platinum on a substrate mounted in the CVD reactor.

US Patent:

61105295, Aug 29, 2000

Filed:

Jun 7, 1995

Appl. No.:

8/484654

Inventors:

Robin A. Gardiner - Bethel CT
Peter S. Kirlin - Bethel CT
Thomas H. Baum - New Fairfield CT
Douglas Gordon - Salt Lake City UT
Timothy E. Glassman - Danbury CT
Sofia Pombrik - Bethel CT
Brian A. Vaartstra - Boise ID

International Classification:

C23C 1600

US Classification:

427250

Abstract:

A method of forming on a substrate a metal film, comprising depositing said metal film on said substrate via chemical vapor deposition from a metalorganic complex of the formula: MA. sub. Y X wherein: M is a y-valent metal; A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MA. sub. y with X; y is an integer having a value of 2, 3 or 4; each of the A ligands may be the same or different; and X is a monodentate or multidentate ligand coordinated to M and containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F. The metal M may be selected from the group consisting of Cu, Ba, Sr, La, Nd, Ce, Pr, Sm, Eu, Th, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Bi, Tl, Y, Pb, Ni, Pd, Pt, Al, Ga, In, Ag, Au, Co, Rh, Ir, Fe, Ru, Sn, Li, Na, K, Rb, Cs, Ca, Mg, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W. A may be selected from the group consisting of. beta. -diketonates,. beta.

US Patent:

57837163, Jul 21, 1998

Filed:

Jun 28, 1996

Appl. No.:

8/673372

Inventors:

Thomas H. Baum - New Fairfield CT
Peter S. Kirlin - Bethel CT
Sofia Pombrik - Bethel CT

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C07F 1500

US Classification:

556136

Abstract:

A platinum source reagent liquid solution, comprising: (i) at least one platinum source compound selected from the group consisting of compounds of the formulae: (A) RCpPt(IV)R'. sub. 3 compounds, of the formula: ##STR1## wherein: R is selected from the group consisting of hydrogen, methyl, ethyl, i-propyl, n-propyl, n-butyl, i-butyl, t-butyl, trimethylsilyl and trimethylsilyl methyl; and each R' is independently selected from the group consisting of methyl, ethyl, i-propyl, n-propyl, n-butyl, i-butyl, t-butyl, trimethylsilyl and trimethylsilyl methyl; and (B) Pt(. beta. -diketonates). sub. 2 of the formula: ##STR2## wherein: each R" is independently selected from the group consisting of methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, trifluoromethyl, perfluoroethyl, and perfluoro-n-propyl, and (ii) a solvent medium therefor. The platinum source reagent liquid solutions of the invention are readily employed in a chemical vapor deposition process system including a liquid delivery apparatus for volatilizing the source reagent liquid solution and transporting the resulting vapor to the chemical vapor deposition reactor for deposition of platinum on a substrate mounted in the CVD reactor.