Tae Hun Chung

US Patent:

7122816, Oct 17, 2006

Filed:

Mar 23, 2005

Appl. No.:

11/088475

Inventors:

J. Martin Algots - San Diego CA, US
Oscar Hemberg - La Jolla CA, US
Tae H. Chung - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01J 35/20
G21K 5/10

US Classification:

250504R, 2504922, 2504931, 378119

Abstract:

An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line. The supply reservoir may comprise a solid form of the plasma source material used to periodically form from a portion of the material in solid form the material in liquid form.

US Patent:

7521652, Apr 21, 2009

Filed:

Dec 7, 2004

Appl. No.:

11/005740

Inventors:

Tae Mark Chung - San Diego CA, US
Raymond J. Bishop - Santa Clarita CA, US
Bradley David Geving - Huntington Beach CA, US
Jon Jody Fong - Calabasas CA, US
Patrick Dunne - Hemel Hempstead, GB

Assignee:

3D Systems, Inc. - Rock Hill SC

International Classification:

B23K 26/14
B22F 7/00

US Classification:

21912184, 21912185, 419 7, 264497

Abstract:

The invention is a method for controllably cooling at least a portion of a part-cake from a laser sintering system to minimize cool down time, maximize throughput, and minimize thermal gradients within the part-cake. The method generally comprises forming one or more thermal transfer channels within the part-cake. The thermal transfer channels can include ducts and cooling fins in the part-cake surrounding the formed part. The method can further comprise removing unfused powder from the ducts and introducing cooling media into the ducts. The invention also includes a part-cake having thermal transfer channels formed therein and a laser sintering apparatus comprising a part-cake containing cylinder having permanent fittings therein for receiving terminal portions of thermal transfer channels formed in the part-cake.

US Patent:

7790096, Sep 7, 2010

Filed:

Mar 31, 2005

Appl. No.:

11/096144

Inventors:

Christian M. Merot - Mesa CO, US
Tae Mark Chung - San Diego CA, US
Raymond J. Bishop - Santa Clarita CA, US

Assignee:

3D Systems, Inc. - Rock Hill SC

International Classification:

B27N 5/00
B29C 35/08
B29C 41/02
B29C 41/52

US Classification:

264497, 264 406

Abstract:

A thermal management system is provided to control the preheating and cool down of a removable build chamber in a laser sintering system. A thermal management station controls preheating of a removable build chamber to heat the chamber to a temperature at or near the operating temperature of the laser sintering system. After insertion into the laser sintering system and completion of a build the thermal management station controls the cool down of the part cake within the removable build chamber after the chamber has been removed from the laser sintering system.

US Patent:

7995637, Aug 9, 2011

Filed:

Oct 21, 2009

Appl. No.:

12/603486

Inventors:

Richard L. Sandstrom - Encinitas CA, US
William N. Partlo - Poway CA, US
Daniel J. W. Brown - San Diego CA, US
Bryan G. Moosman - San Marcos CA, US
Tae H. Chung - Murrieta CA, US
Thomas P. Duffey - San Diego CA, US
James J. Ferrell - Temecula CA, US
Terance Hilsabeck - San Marcos CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/22

US Classification:

372 58, 372 55

Abstract:

One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0. 3 and about 0. 7 inch.

US Patent:

20070253459, Nov 1, 2007

Filed:

Apr 16, 2007

Appl. No.:

11/787463

Inventors:

Richard Sandstrom - Encinitas CA, US
Tae (Mark) Chung - Murrieta CA, US
Richard Ujazdowski - Poway CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/097
H01S 3/038

US Classification:

372087000

Abstract:

Disclosed herein are systems and methods for extending one or both of the discharge electrodes in a transverse discharge gas laser chamber in which one or both the electrodes are subject to a dimensional change due to erosion. Electrode extension can be performed to increase the chamber life, increase laser performance over the life of the chamber, or both. Operationally, the inter-electrode spacing may be adjusted to maintain a specific target gap distance between the electrodes or to optimize a specific parameter of the laser output beam such as bandwidth, pulse-to-pulse energy stability, beam size, etc.