Thomas J Mercer

US Patent:

20130277332, Oct 24, 2013

Filed:

Mar 4, 2013

Appl. No.:

13/784386

Inventors:

William Brock Alexander - St. George UT, US
Sang-ho Lee - North Wales PA, US
Thomas Mercer - Annapolis MD, US
Vasil Vorsa - Coopersburg PA, US

International Classification:

C23F 11/00

US Classification:

216 41, 1563453

Abstract:

Included within the scope of the invention are plasma etch-resistant films for substrates. The films include a yttria material and a at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}. Also included are methods of manufacturing plasma etch-resistant films on a substrate. Such methods include applying a yttria material-containing composition onto at least a portion of a surface of a substrate to form a film. The film includes a yttria material and at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}.

US Patent:

20140099491, Apr 10, 2014

Filed:

Oct 9, 2012

Appl. No.:

13/647949

Inventors:

Mohammed Ameen - Souderton PA, US
Sang-Ho Lee - North Wales PA, US
Thomas Mercer - Annapolis MD, US
Vasil Vorsa - Coopersburg PA, US

International Classification:

C01F 17/00
C23C 16/40
H01L 21/02

US Classification:

428220, 423263, 4272481, 427576, 427535, 216 67

Abstract:

The invention includes a plasma etch-resistant film for a substrate comprising a yttria material wherein at least a portion of the yttria material is in a crystal phase having a crystal lattice structure, wherein at least 50% of the yttria material is in a form of a monoclinic crystal system. The film may be treated by exposure to a fluorine gas plasma. Also included are plasma etch-resistant articles that include a substrate and a film, wherein the film comprises an yttria material and at least a portion of the yttria material is present in the film in a crystal phase having a crystal lattice structure and at least 50% of the yttria material is in a form of a monoclinic crystal system. Several methods are contemplated within the scope of the invention.