Usama Dadu from 1300 Crestview Dr, Hollister, CA 95023

Self-Aligned Contact Etch With High Sensitivity To Nitride Shoulder
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US Patent:

20060051968, Mar 9, 2006
Filed:

Dec 12, 2002
Appl. No.:

10/498857
Inventors:

Ajey Joshi - San Jose CA, US
Pui Man Ng - Sunnyvale CA, US
James Stinnett - Mountain View CA, US
Usama Dadu - Hollister CA, US
Jason Regis - Kingston NH, US
International Classification:

H01L 21/302
H01L 21/461
US Classification:

438723000, 438712000, 438711000, 438710000
Abstract:

A method and apparatus are provided for etching semiconductor and dielectric substrates through the use of plasmas based on mixtures of a first gas having the formula CF, and a second gas having the formula CHF, wherein a/b≧⅔, and wherein x/z≧. The mixtures may be used in low or medium density plasmas sustained in a magnetically enhanced reactive ion chamber to provide a process that exhibits excellent corner layer selectivity, photo resist selectivity, under layer selectivity, and profile and bottom CD control. The percentages of the first and second gas may be varied during etching to provide a plasma that etches undoped oxide films or to provide an etch stop on such films.

Showerhead Having A Detachable High Resistivity Gas Distribution Plate
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US Patent:

20200194229, Jun 18, 2020
Filed:

Feb 25, 2020
Appl. No.:

16/800285
Inventors:

- Santa Clara CA, US
HAMID NOORBAKHSH - Fremont CA, US
VLADIMIR KNYAZIK - Santa Clara CA, US
JISOO KIM - Pleasanton CA, US
WONSEOK LEE - San Jose CA, US
USAMA DADU - Hollister CA, US
International Classification:

H01J 37/32
Abstract:

Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.

Showerhead Having A Detachable High Resistivity Gas Distribution Plate
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US Patent:

20180190473, Jul 5, 2018
Filed:

Mar 1, 2018
Appl. No.:

15/909118
Inventors:

- Santa Clara CA, US
HAMID NOORBAKHSH - Fremont CA, US
VLADIMIR KNYAZIK - Santa Clara CA, US
JISOO KIM - Pleasanton CA, US
WONSEOK LEE - San Jose CA, US
USAMA DADU - Hollister CA, US
International Classification:

H01J 37/32
Abstract:

Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the body, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body; and a thermal gasket disposed in a gap between the body and gas distribution plate.

Showerhead Having A Detachable High Resistivity Gas Distribution Plate
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US Patent:

20160005571, Jan 7, 2016
Filed:

Jun 3, 2015
Appl. No.:

14/729736
Inventors:

- Santa Clara CA, US
HAMID NOORBAKHSH - Fremont CA, US
VLADIMIR KNYAZIK - Santa Clara CA, US
JISOO KIM - Pleasanton CA, US
WONSEOK LEE - San Jose CA, US
USAMA DADU - Hollister CA, US
International Classification:

H01J 37/32
H01L 21/67
Abstract:

Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.

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Usama Dadu